Temperature-induced apparent mass changes observed during quartz crystal microbalance measurements of atomic layer deposition

Analytical Chemistry

Volumn 75, Issue 19, 2003, Pages 4975-4982

  Rocklein, M N ^a   George, S M ^a,b  

^a UNIVERSITY OF COLORADO   (United States)

^b UCB 450   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DEPOSITION; FILM GROWTH; MASS TRANSFER; SURFACE CHEMISTRY; THERMAL EFFECTS;

ATOMIC LAYER DEPOSITION (ALD);

QUARTZ;

ALUMINUM OXIDE; SILICON DIOXIDE; WATER;

ANALYTIC METHOD; ANALYTICAL ERROR; ARTICLE; ATOMIC PARTICLE; CALCULATION; COOLING; FILM; GAS; MASS; QUARTZ CRYSTAL MICROBALANCE; REACTOR; SENSOR; TEMPERATURE DEPENDENCE;

EID: 0141993622     PISSN: 00032700     EISSN: None     Source Type: Journal    
DOI: 10.1021/ac030141u     Document Type: Article

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