Size dependent effects in nucleation of Ru and Ru oxide thin films by atomic layer deposition measured by synchrotron radiation X-ray diffraction

Chemistry of Materials

Volumn 25, Issue 17, 2013, Pages 3458-3463

  Methaapanon, Rungthiwa ^a   Geyer, Scott M ^a   Brennan, Sean ^b   Bent, Stacey F ^a  

^a Stanford University   (United States)

^b Fairview Associates   (United States)

Author keywords

atomic layer deposition; nucleation; Ru; RuO2; XRD

Indexed keywords

GROWTH DIRECTIONS; PREFERENTIAL ORIENTATION; RATE-LIMITING STEPS; RUO2; SIZE-DEPENDENT EFFECT; SUBSURFACE OXYGEN; SYNCHROTRON RADIATION X-RAY DIFFRACTIONS; XRD;

DEPOSITION; NUCLEATION; OXIDE MINERALS; OXYGEN; RUTHENIUM; RUTHENIUM ALLOYS; RUTHENIUM COMPOUNDS; SYNCHROTRON RADIATION; X RAY DIFFRACTION;

ATOMIC LAYER DEPOSITION;

EID: 84884181870     PISSN: 08974756     EISSN: 15205002     Source Type: Journal    
DOI: 10.1021/cm401585k     Document Type: Article

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