Portable atomic layer deposition reactor for in situ synchrotron photoemission studies

Review of Scientific Instruments

Volumn 84, Issue 1, 2013, Pages

  Methaapanon, R ^a   Geyer, S M ^a   Hagglund, C ^a   Pianetta, P A ^a   Bent, S F ^a  

^a Stanford University   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

BEAM ALIGNMENTS; BEAM LINES; HALF REACTIONS; IN-SITU SYNCHROTRONS; MECHANISTIC STUDIES; UHV CHAMBERS; ULTRAHIGH VACUUM CHAMBER;

PHOTOEMISSION; STRUCTURAL DESIGN;

ATOMIC LAYER DEPOSITION;

EID: 84874092683     PISSN: 00346748     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.4773230     Document Type: Article

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