In situ study of ALD processes using synchrotron-based X-ray fluorescence and scattering techniques

ECS Transactions

Volumn 50, Issue 13, 2013, Pages 35-42

  Dendooven, J ^a   Devloo Casier, K ^a   Ide, M ^a   Grandfield, K ^b   Ludwig, K F ^c   Bals, S ^b   Van Der Voort, P ^a   Detaverniera, C ^a  

^a GHENT UNIVERSITY   (Belgium)

^b UNIVERSITY OF ANTWERP   (Belgium)

^c USA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMS; BOTTLES; FLUORESCENCE; HAFNIUM OXIDES; OXIDE MINERALS; SURFACE ROUGHNESS; TITANIUM DIOXIDE; X RAY SCATTERING;

GE SURFACES; GRAZING INCIDENCE SMALL-ANGLE X-RAY SCATTERING; IN-SITU CHARACTERIZATION; IN-SITU STUDY; INK-BOTTLES; POROUS TITANIA; SCATTERING TECHNIQUES; X RAY FLUORESCENCE;

ATOMIC LAYER DEPOSITION;

EID: 84885820691     PISSN: 19385862     EISSN: 19386737     Source Type: Conference Proceeding    
DOI: 10.1149/05013.0035ecst     Document Type: Conference Paper

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