Young modulus and Poisson ratio measurements of TiO 2 thin films deposited with Atomic Layer Deposition

Surface and Coatings Technology

Volumn 206, Issue 8-9, 2012, Pages 2459-2463

  Borgese, L ^a   Gelfi, M ^a   Bontempi, E ^a   Goudeau, P ^b   Geandier, G ^c   Thiaudiere D ^d   Depero, L E ^a  

^a UNIVERSITY OF BRESCIA   (Italy)

^b UNIVERSITÉ DE POITIERS   (France)

^c UNIVERSITÉ PAUL VERLAINE METZ   (France)

^d SYNCHROTRON SOLEIL   (France)

Author keywords

ALD; Anatase; Poisson ratio; TiO 2; XRD; Young modulus

Indexed keywords

ADHESION CHARACTERISTIC; ALD; ATOMIC LAYER; COMPLEX GEOMETRIES; CONFORMALITY; ELASTIC PROPERTIES; EX SITU; EXPERIMENTAL CONDITIONS; IN-SITU TENSILE TESTING; KAPTON SUBSTRATE; LOW TEMPERATURES; LOW-TEMPERATURE DEPOSITION; MECHANICAL PERFORMANCE; MICROSTRUCTURE OF FILMS; MULTIFUNCTIONAL PROPERTIES; SURFACE LAYERS; TIO; TITANIA THIN FILMS; XRD; YOUNG MODULUS;

ADHESION; ATOMIC LAYER DEPOSITION; ATOMS; BIOCOMPATIBILITY; PHOTOCATALYSIS; POISSON RATIO; POLYIMIDES; SURFACE PROPERTIES; SURFACES; TENSILE TESTING; THIN FILMS; TITANIUM DIOXIDE; VAPOR DEPOSITION; X RAY DIFFRACTION; X RAY DIFFRACTION ANALYSIS;

DEPOSITION;

EID: 84855287641     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2011.10.050     Document Type: Article

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