Optical emission spectroscopy as a tool for studying, optimizing, and monitoring plasma-assisted atomic layer deposition processes

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 28, Issue 1, 2010, Pages 77-87

  MacKus, A J M ^a   Heil, S B S ^a   Langereis, E ^a   Knoops, H C M ^a   Van De Sanden, M C M ^a   Kessels, W M M ^a  

^a EINDHOVEN UNIVERSITY OF TECHNOLOGY   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC LAYER; DEPOSITION PROCESS; HALF REACTIONS; PLASMA EXPOSURE; PRECURSOR DOSING; PROCESS FAULTS; PRODUCTION EQUIPMENTS; REACTANT SPECIES; REACTION MECHANISM; REACTOR WALLS; REAL TIME; TIME RESOLVED MEASUREMENT; TIME-RESOLVED;

ATOMIC SPECTROSCOPY; DEPOSITION; EMISSION SPECTROSCOPY; FILM GROWTH; LIGHT EMISSION; OPTICAL EMISSION SPECTROSCOPY; OPTIMIZATION; PHOTORESISTS; PLASMAS; PROCESS MONITORING; PULSED LASER DEPOSITION; SURFACE REACTIONS;

PLASMA DEPOSITION;

EID: 73849140446     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.3256227     Document Type: Article

References (38)

1. M. Ritala and M. Leskelä, in Handbook of Thin Film Materials, edited by, H. S. Nalwa, (Academic, San Diego, CA, 2001), Vol. 1, p. 103.
2. L. Henn-Lecordier, W. Lei, M. Anderle, and G. W. Rubloff, J. Vac. Sci. Technol. B 25, 130 (2007). 10.1116/1.2429672 (Pubitemid 46512015)
3. S. B. S. Heil, J. L. van Hemmen, M. C. M. van de Sanden, and W. M. M. Kessels, J. Appl. Phys. 103, 103302 (2008). 10.1063/1.2924406 (Pubitemid 351776438)
4. S. B. S. Heil, F. Roozeboom, M. C. M. van de Sanden, and W. M. M. Kessels, J. Vac. Sci. Technol. A 26, 472 (2008). 10.1116/1.2905250 (Pubitemid 351620214)
5. A. Rahtu, T. Alaranta, and M. Ritala, Langmuir 17, 6506 (2001). 10.1021/la010103a (Pubitemid 35330632)
6. H. Kim and S. M. Rossnagel, J. Vac. Sci. Technol. A 20, 802 (2002). 10.1116/1.1469009 (Pubitemid 34648323)
7. S. B. S. Heil, E. Langereis, A. Kemmeren, F. Roozeboom, M. C. M. van de Sanden, and W. M. M. Kessels, J. Vac. Sci. Technol. A 23, L5 (2005). 10.1116/1.1938981 (Pubitemid 43119171)
8. E. Langereis, S. B. S. Heil, M. C. M. van de Sanden, and W. M. M. Kessels, J. Appl. Phys. 100, 023534 (2006). 10.1063/1.2214438 (Pubitemid 44179544)
9. J. L. van Hemmen, S. B. S. Heil, J. H. Klootwijk, F. Roozeboom, C. J. Hodson, M. C. M. van de Sanden, and W. M. M. Kessels, J. Electrochem. Soc. 154, G165 (2007). 10.1149/1.2737629 (Pubitemid 46872260)
10. E. Langereis, H. C. M. Knoops, A. J. M. Mackus, F. Roozeboom, M. C. M. van de Sanden, and W. M. M. Kessels, J. Appl. Phys. 102, 083517 (2007). 10.1063/1.2798598 (Pubitemid 350025632)
11. D. Schmidt, S. Strehle, M. Albert, W. Hentsch, and J. W. Bartha, Microelectron. Eng. 85, 527 (2008). 10.1016/j.mee.2007.09.006 (Pubitemid 351227362)
12. H. Kim, A. J. Kellock, and S. M. Rossnagel, J. Appl. Phys. 92, 7080 (2002). 10.1063/1.1519949
13. S. X. Lao, R. M. Martin, and J. P. Chang, J. Vac. Sci. Technol. A 23, 488 (2005). 10.1116/1.1894666 (Pubitemid 43119298)
14. J. Y. Kim, S. H. Kim, H. Seo, J. H. Kim, and H. Jeon, Electrochem. Solid-State Lett. 8, G82 (2005). 10.1149/1.1854773 (Pubitemid 40407213)
15. J. Choi, S. Kim, J. Kim, H. Kang, H. Jeon, and C. Bae, J. Vac. Sci. Technol. A 24, 900 (2006). 10.1116/1.2198865 (Pubitemid 43959090)
16. S. B. S. Heil, E. Langereis, F. Roozeboom, M. C. M. van de Sanden, and W. M. M. Kessels, J. Electrochem. Soc. 153, G956 (2006). 10.1149/1.2344843 (Pubitemid 44538348)
17. R. Sreenivasan, T. Sugawara, K. C. Saraswat, and P. C. McIntyre, Appl. Phys. Lett. 90, 102101 (2007). 10.1063/1.2643085 (Pubitemid 46398421)
18. S. B. S. Heil, P. Kudlacek, E. Langereis, R. Engeln, M. C. M. van de Sanden, and W. M. M. Kessels, Appl. Phys. Lett. 89, 131505 (2006). 10.1063/1.2357886 (Pubitemid 44484071)
19. J. W. Coburn and M. Chen, J. Appl. Phys. 51, 3134 (1980). 10.1063/1.328060 (Pubitemid 11441215)
20. V. M. Donnelly, in Plasma Diagnostics, edited by, O. Auciello, and, D. L. Flamm, (Academic, Washington, DC, 1989), Vol. I, p. 1.
21. M. A. Lieberman and A. J. Lichtenberg, Principles of Plasma Discharges and Materials Processing (Wiley, New York, 2005).
22. U. Fantz, Plasma Sources Sci. Technol. 15, S137 (2006). 10.1088/0963-0252/15/4/S01 (Pubitemid 44679438)
23. S. B. S. Heil, J. L. van Hemmen, C. J. Hodson, N. Singh, J. H. Klootwijk, F. Roozeboom, M. C. M. van de Sanden, and W. M. M. Kessels, J. Vac. Sci. Technol. A 25, 1357 (2007). 10.1116/1.2753846 (Pubitemid 47330598)
24. E. Langereis, M. Creatore, S. B. S. Heil, M. C. M. van de Sanden, and W. M. M. Kessels, Appl. Phys. Lett. 89, 081915 (2006). 10.1063/1.2338776 (Pubitemid 44286139)
25. W. J. Maeng, S. J. Park, and H. Kim, J. Vac. Sci. Technol. B 24, 2276 (2006). 10.1116/1.2345205 (Pubitemid 44496209)
26. J. W. Lim, S. J. Yun, and J. H. Lee, Electrochem. Solid-State Lett. 7, F73 (2004). 10.1149/1.1805502
27. W. J. Maeng and H. Kim, Electrochem. Solid-State Lett. 9, G191 (2006). 10.1149/1.2186427
28. Q. Xie, J. Musschoot, D. Deduytsche, R. L. van Meirhaeghe, C. Detavernier, S. van den Berghe, Y. L. Jiang, G. P. Ru, B. Z. Li, and X. P. Qu, J. Electrochem. Soc. 155, H688 (2008). 10.1149/1.2955724
29. M. W. Kiehlbauch and D. B. Graves, J. Vac. Sci. Technol. A 21, 660 (2003). 10.1116/1.1564024
30. R. W. B. Pearse and A. G. Gaydon, The Identification of Molecular Spectra (Chapman and Hall, London, 1976).
31. Plasus Ingenieurbüro, Plasus SpecLine (Version 2.1). Spectral line identification for atoms and molecules (2004).
32. See EPAPS supplementary material at E-JVTAD6-28-004001 for a movie of the plasma emission during a plasma-assisted ALD cycle.
33. S. B. Dollins, A. Srivastava, and B. E. Flinchbaugh, IEEE Trans. Semicond. Manuf. 1, 23 (1988). 10.1109/66.4369 (Pubitemid 18612165)
34. D. A. White, B. E. Goodlin, A. E. Gower, D. S. Boning, H. Chen, H. H. Sawin, T. J. Dalton, IEEE Trans. Semicond. Manuf. 13, 193 (2000). 10.1109/66.843635 (Pubitemid 30883233)
35. S. W. Butler, J. Vac. Sci. Technol. B 13, 1917 (1995). 10.1116/1.588109
36. S. L. Xu, Z. W. Sun, X. Y. Qian, J. Holland, and D. Podlesnik, J. Vac. Sci. Technol. B 19, 166 (2001). 10.1116/1.1330266 (Pubitemid 32254508)
37. S. J. Ullal, A. R. Godfrey, E. Edelberg, L. Braly, V. Vahedi, and E. S. Aydil, J. Vac. Sci. Technol. A 20, 43 (2002). 10.1116/1.1421602 (Pubitemid 34138326)
38. L. Chen, W. Jiang, T. Pao, B. Lin, L. Xu, G. Ji, and H. Cai, J. Electrochem. Soc. 155, D699 (2008). 10.1149/1.2971022