In situ ALD experiments with synchrotron radiation photoelectron spectroscopy

Semiconductor Science and Technology

Volumn 27, Issue 7, 2012, Pages

  Tallarida, Massimo ^a   Schmeisser, Dieter ^a  

^a BRANDENBURG UNIVERSITY OF TECHNOLOGY   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ALD PRECURSOR; GAAS; IN-SITU; SURFACE OXIDE; SURFACE SENSITIVITY; SYNCHROTRON RADIATION PHOTOELECTRON SPECTROSCOPY;

PHOTOELECTRON SPECTROSCOPY; SUBSTRATES; SYNCHROTRON RADIATION;

ATOMIC LAYER DEPOSITION;

EID: 84862734520     PISSN: 02681242     EISSN: 13616641     Source Type: Journal    
DOI: 10.1088/0268-1242/27/7/074010     Document Type: Article

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