Atomic layer deposition of TiO2 on surface modified nanoporous low- K films

Langmuir

Volumn 29, Issue 39, 2013, Pages 12284-12289

  Levrau, Elisabeth ^a   Devloo Casier, Kilian ^a   Dendooven, Jolien ^a   Ludwig, Karl F ^b   Verdonck, Patrick ^c   Meersschaut, Johan ^c   Baklanov, Mikhail R ^c   Detavernier, Christophe ^a  

^a GHENT UNIVERSITY   (Belgium)

^b USA   (United States)

^c IMEC   (Belgium)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL SURFACES; ELLIPSOMETRIC POROSIMETRY; HYDROPHILIC SURFACES; HYDROPHOBIC FILM; HYDROPHOBIC SURFACES; LOW DIELECTRIC CONSTANTS; NANOPOROUS THIN FILMS; WATER CONTACT ANGLE (WCA);

DEPOSITION; DIELECTRIC MATERIALS; FILM GROWTH; HYDROPHILICITY; HYDROPHOBICITY; PLASMA APPLICATIONS; PLASMAS; SILICON; SURFACE CHEMISTRY; SURFACES; TITANIUM DIOXIDE;

ATOMIC LAYER DEPOSITION;

EID: 84884995803     PISSN: 07437463     EISSN: 15205827     Source Type: Journal    
DOI: 10.1021/la4027738     Document Type: Article

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