Synchrotron X-ray reflectivity study of high dielectric constant alumina thin films prepared by atomic layer deposition

Thin Solid Films

Volumn 510, Issue 1-2, 2006, Pages 159-163

  Hwang, Yongtaek ^a   Heo, Kyuyoung ^a   Chang, Chang Hwan ^b   Joo, Man Kil ^b   Ree, Moonhor ^a  

^a Pohang University of Science and Technology (POSTECH)   (South Korea)

^b Research Institute of Industrial Science and Technology (RIST)   (South Korea)

Author keywords

Aluminium oxide; Atomic layer deposition; Dielectrics; Synchrotron X ray reflectivity

Indexed keywords

DIELECTRIC FILMS; NITROGEN; OZONE; PERMITTIVITY; SYNCHROTRONS; THIN FILMS;

ALUMINA THIN FILMS; ALUMINIUM OXIDE; ATOMIC LAYER DEPOSITION (ALD); SYNCHROTRON X-RAY REFLECTIVITY;

ALUMINA;

EID: 33646512181     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2005.12.162     Document Type: Article

References (17)

1. Wilk G.D., Wallace R.M., and Anthony J.M. J. Appl. Phys. 89 (2001) 5243
2. Hubbard K.J., and Schlom D.G. J. Mater. Res. 11 (1996) 2757
3. Robertson J. J. Vac. Sci. Technol., B 18 (2000) 1785
4. Buchanan D.A., Gusev E.P., Cartier E., Okorn-Schmidt H., Rim K., Gribelyuk M.A., Mocuta A., Ajmera A., Copel M., Guha S., Bojarczuk N., Callegari A., D'Emic C., Kozlowski P., Chan K., Fleming R.J., Jamison P.C., Brown J., and Arndt R. Internl. Electron Devices Meeting, Washington, D.C., U.S.A., December 10-13, 2000. Technical Digest (2000) 223
5. Gusev E.P., Buchanan D.A., Cartier E., Kumar A., DiMaria D., Guha S., Callegari A., Zafar S., Jamison P.C., Neumayer D.A., Copel M., Gribelyuk M.A., Okorn-Schmidt H., D'Emic C., Kozlowski P., Chan K., Bojarczuk N., Ragnarsson L.-A., Ronsheim P., Rim K., Fleming R.J., Mocuta A., and Ajmera A. Internl. Electron Devices Meeting, Washington, D.C., U.S.A., December 2-5, 2001. Technical Digest (2001) 451
6. Boher P., Defranoux C., Heinrich P., Wolstenholme J., and Bender H. Mater. Sci. Eng., B, Solid-State Mater. Adv. Technol. 109 (2004) 64
7. Wu W., and Liou H.-C. Thin Solid Films 312 (1999) 73
8. Wu W., Wallace W.E., Lin E.K., Lynn G.W., Glinka C.J., Ryan E.T., and Ho H.M. J. Appl. Phys. 87 (2000) 1193
9. Kern W. J. Electrochem. Soc. 137 (1990) 1887
10. Bolze J., Ree M., Youn H.S., Chu S.-H., and Char K. Langmuir 17 (2001) 6683
11. Gibaud A., Vignaud G., and Sinha S.K. Acta Crystallogr., A 49 (1993) 642
12. Russell T.P. Mater. Sci. Rep. 5 (1990) 171
13. Tolan M. X-ray Scattering from Soft-matter Thin Films (1999), Springer-Verlag, Berlin
14. Wu W.-L., Wallace W.E., Lin E.K., Lynn G.W., Glinka C.J., Ryan E.T., and Ho H.-M. J. Appl. Phys. 87 (2000) 1193
15. Buttard D., Dolino G., Bellet D., Baumbach T., and Rieutord F. Solid State Commun. 109 (1999) 1
16. Kiessig H. Ann. Phys. 10 (1931) 769
17. Parratt L.G. Phys. Rev. 95 (1954) 359