Influence of composition, bonding characteristics and microstructure on the electrochemical and optical stability of AlOxNy thin films

Electrochimica Acta

Volumn 106, Issue , 2013, Pages 23-34

  Borges, J ^a   Fonseca, C ^b,c   Barradas, N P ^d   Alves, E ^d   Girardeau, T ^e   Paumier, F ^e   Vaz, F ^a   Marques, L ^a  

^a UNIVERSITY OF MINHO   (Portugal)

^b UNIVERSITY OF PORTO   (Portugal)

^c UNIVERSITY OF COIMBRA   (Portugal)

^d INSTITUTO SUPERIOR TÉCNICO   (Portugal)

^e UPR 3346 CNRS   (France)

Author keywords

Corrosion; EIS; Optical stability; Thin films

Indexed keywords

ALUMINUM; AMORPHOUS FILMS; CORROSION; CORROSION RESISTANCE; ELECTROCHEMICAL CORROSION; ELECTROCHEMICAL IMPEDANCE SPECTROSCOPY; NANOCOMPOSITE FILMS; NITRIDES; OXIDE FILMS; THIN FILMS;

AMORPHOUS MATRICES; BONDING CHARACTERISTICS; COMPOSITION RANGES; DIFFERENT STRUCTURE; ELECTROCHEMICAL BEHAVIOUR; OPTICAL REFLECTANCE; OPTICAL STABILITY; OXYGEN AND NITROGENS;

OPTICAL FILMS;

EID: 84879055345     PISSN: 00134686     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.electacta.2013.05.020     Document Type: Article

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