Preparation and characterization of CrN x O y thin films: The effect of composition and structural features on the electrical behavior

Applied Surface Science

Volumn 257, Issue 21, 2011, Pages 9120-9124

  Arvinte, R ^a,b   Borges, J ^a   Sousa, R E ^a   Munteanu, D ^b   Barradas, N P ^c   Alves, E ^c   Vaz, F ^a   Marques, L ^a  

^a UNIVERSITY OF MINHO   (Portugal)

^b TRANSILVANIA UNIVERSITY OF BRASOV   (Romania)

^c INSTITUTO TECNOLÓGICO E NUCLEAR   (Portugal)

Author keywords

Chromium oxynitride; Electrical resistivity; Magnetron sputtering

Indexed keywords

CHEMICAL BONDS; ELECTRIC CONDUCTIVITY; FILM PREPARATION; FLOW OF GASES; MAGNETRON SPUTTERING; NITRIDES; REACTIVE SPUTTERING; THIN FILMS; TRANSITION METALS;

CHEMICAL COMPOSITIONS; DC REACTIVE MAGNETRON SPUTTERING; DEPOSITION PARAMETERS; ELECTRICAL BEHAVIORS; OXYNITRIDES; REACTIVE SPUTTERING PROCESS; TRANSITION METAL NITRIDES; TRIBOLOGICAL RESPONSE;

CHROMIUM COMPOUNDS;

EID: 79960176231     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2011.05.109     Document Type: Article

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