Optical and electrical properties of W-O-N coatings deposited by DC reactive sputtering

Plasma Processes and Polymers

Volumn 4, Issue SUPPL.1, 2007, Pages

  Parreira, Nuno M G ^a   Polcar, Tomas ^a   Martin, Nicolas ^b   Banakh, Oksana ^c   Cavaleiro, Albano ^a  

^a UNIVERSITY OF COIMBRA   (Portugal)

^b Centre National de la Recherche Scientifique   (France)

^c University of Applied Sciences   (Switzerland)

Author keywords

Electrical properties; Optical properties; Sputtering; Structural characterization; Tungsten oxynitrides

Indexed keywords

CHEMICAL COMPOSITIONS; DC REACTIVE MAGNETRON SPUTTERING; DC REACTIVE SPUTTERING; ELECTRICAL AND OPTICAL PROPERTIES; ELECTRICAL PROPERTIES; FOUR-POINT PROBE; NITROGEN FLOW; OPTICAL AND ELECTRICAL PROPERTIES; OXYGEN CONTENT; OXYNITRIDE FILMS; STRUCTURAL CHARACTERIZATION; TOTAL PRESSURE; TUNGSTEN NITRIDE; TUNGSTEN OXIDE; TUNGSTEN OXYNITRIDES;

CHEMICAL ANALYSIS; COATINGS; ELECTRIC PROPERTIES; ELECTRON PROBE MICROANALYSIS; HARDENING; NITRIDES; OXIDE FILMS; OXYGEN; PROBES; STRUCTURAL PROPERTIES; TUNGSTEN; TUNGSTEN COMPOUNDS;

OPTICAL PROPERTIES;

EID: 42749088462     PISSN: 16128850     EISSN: 16128869     Source Type: Journal    
DOI: 10.1002/ppap.200730405     Document Type: Conference Paper

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