X-ray photoelectron spectroscopy characterization of aluminum nitride surface oxides: Thermal and hydrothermal evolution

Journal of Electronic Materials

Volumn 36, Issue 4, 2007, Pages 414-419

  Dalmau, R ^a   Collazo, R ^a   Mita, S ^a   Sitar, Z ^a  

^a North Carolina State University   (United States)

Author keywords

Alumina; Aluminum hydroxides; Aluminum nitride (AlN); Oxidation; X ray photoelectron spectroscopy (XPS)

Indexed keywords

ALUMINUM HYDROXIDES; ALUMINUM NITRIDE (ALN); DEHYDRATION MECHANISM;

ANNEALING; BINDING ENERGY; EPITAXIAL GROWTH; OXIDATION; OXIDES; X RAY PHOTOELECTRON SPECTROSCOPY;

SEMICONDUCTING ALUMINUM COMPOUNDS;

EID: 34249088714     PISSN: 03615235     EISSN: None     Source Type: Journal    
DOI: 10.1007/s11664-006-0044-x     Document Type: Conference Paper

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