AlN x O y thin films deposited by DC reactive magnetron sputtering

Applied Surface Science

Volumn 257, Issue 5, 2010, Pages 1478-1483

  Borges, J ^a   Vaz, F ^a   Marques, L ^a  

^a UNIVERSITY OF MINHO   (Portugal)

Author keywords

Aluminium nitride; Aluminium oxide; DC magnetron; Electrical resistivity; Morphology; Reactive sputtering; Structure

Indexed keywords

ALUMINA; ALUMINUM NITRIDE; ALUMINUM OXIDE; AMORPHOUS FILMS; DEPOSITION RATES; ELECTRIC CONDUCTIVITY; GAS MIXTURES; GASES; III-V SEMICONDUCTORS; MAGNETRON SPUTTERING; MORPHOLOGY; PARTIAL PRESSURE; REACTIVE SPUTTERING; STRUCTURE (COMPOSITION);

ALUMINIUM OXIDE; CHEMICAL COMPOSITIONS; DC REACTIVE MAGNETRON SPUTTERING; DISCHARGE CURRENTS; DISCHARGE PARAMETERS; FILM PROPERTIES; INSULATOR FILMS; REACTIVE GAS MIXTURES;

THIN FILMS;

EID: 78049251323     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2010.08.076     Document Type: Article

References (32)

1. K.R. Bray, R.L.C. Wu, S. Fries-Carr, and J. Weimer Aluminum oxynitride dielectrics for multilayer capacitors with higher energy density and wide temperature properties Thin Solid Films 518 2009 366 371
2. J. Wang, W.L. Wang, P.D. Ding, Y.X. Yang, L. Fang, J. Esteve, M.C. Polo, and G. Sanchez Synthesis of cubic aluminum nitride by carbothermal nitridation reaction Diamond and Related Materials 8 1999 1342 1344
3. X. Qing, X. Hui, and L.R. Arthur Pressure-induced rocksalt phase of aluminum nitride: a metastable structure at ambient condition Journal of Applied Physics 73 1993 8198 8200
4. L. Yate, J.C. Caicedo, A.H. Macias, F.J. Espinoza-Beltrán, G. Zambrano, J. Muñoz-Saldaña, and P. Prieto Composition and mechanical properties of AlC, AlN and AlCN thin films obtained by r.f. magnetron sputtering Surface and Coatings Technology 203 2009 1904 1907
5. H.C. Barshilia, B. Deepthi, and K.S. Rajam Growth and characterization of aluminum nitride coatings prepared by pulsed-direct current reactive unbalanced magnetron sputtering Thin Solid Films 516 2008 4168 4174
6. V. Mortet, M. Nesladek, K. Haenen, A. Morel, M. D'Olieslaeger, and M. Vanecek Physical properties of polycrystalline aluminium nitride films deposited by magnetron sputtering Diamond and Related Materials 13 2004 1120 1124
7. N. Rakov, A. Mahmood, and M. Xiao Surface metallic state of aluminum-nitride (AlN) thin films prepared by direct current (DC)-reactive magnetron sputtering: optical spectroscopic analysis with incoherent light Scripta Materialia 50 2004 589 592
8. Q.X. Guo, M. Yoshitugu, T. Tanaka, M. Nishio, and H. Ogawa Microscopic investigations of aluminum nitride thin films grown by low-temperature reactive sputtering Thin Solid Films 483 2005 16 20
9. L. Igor, and B. David Metastable alumina polymorphs: crystal structures and transition sequences Journal of the American Ceramic Society 81 1998 1995 2012
10. J.M. Schneider, W.D. Sproul, and A. Matthews Reactive ionized magnetron sputtering of crystalline alumina coatings Surface and Coatings Technology 98 1998 1473 1476
11. A. Aryasomayajula, S. Canovic, D. Bhat, M.H. Gordon, and M. Halvarsson Transmission electron microscopy and X-ray diffraction analysis of alumina coating by alternate-current inverted magnetron-sputtering technique Thin Solid Films 516 2007 397 401
12. H. Kakati, A.R. Pal, H. Bailung, and J. Chutia Deposition of nanostructured crystalline and corrosion resistant alumina film on bell metal at low temperature by rf magnetron sputtering Applied Surface Science 255 2009 7403 7407
13. B.G. Segda, M. Jacquet, and J.P. Besse Elaboration, characterization and dielectric properties study of amorphous alumina thin films deposited by r.f. magnetron sputtering Vacuum 62 2001 27 38
14. S Dreer, R. Krismer, P. Wilhartitz, and G. Friedbacher Statistical evaluation of refractive index, growth rate, hardness and Young's modulus of aluminium oxynitride films Thin Solid Films 354 1999 43 49
15. N.P. Barradas, C. Jeynes, and R.P. Webb Simulated annealing analysis of Rutherford backscattering data Applied Physics Letters 71 1997 291 293
16. I. Horcas, R. Fernandez, J.M. Gomez-Rodriguez, J. Colchero, J. Gomez-Herrero, and A.M. Baro WSXM: a software for scanning probe microscopy and a tool for nanotechnology Review of Scientific Instruments 78 2007 013705
17. A.W. Robert An algorithm for computing linear four-point probe thickness correction factors Review of Scientific Instruments 72 2001 3580 3586
18. P. Carvalho, F. Vaz, L. Rebouta, L. Cunha, C.J. Tavares, C. Moura, E. Alves, A. Cavaleiro, G. Ph, E.L. Bourhis, J.P. Riviere, J.F. Pierson, and O. Banakh Structural, electrical, optical, and mechanical characterizations of decorative ZrO[sub x]N[sub y] thin films Journal of Applied Physics 98 2005 023715
19. I Safi Recent aspects concerning DC reactive magnetron sputtering of thin films: a review Surface and Coatings Technology 127 2000 203 218
20. D. Depla, J. Haemers, and R. De Gryse Discharge voltage measurements during reactive sputtering of oxides Thin Solid Films 2006 468 471 (Pubitemid 44404202)
21. J.A. Thornton Magnetron sputtering: basic physics and application to cylindrical magnetrons Journal of Vacuum Science and Technology 15 1978 171 177
22. D. Depla, G. Buyle, J. Haemers, and R. De Gryse Discharge voltage measurements during magnetron sputtering Surface and Coatings Technology 200 2006 4329 4338 (Pubitemid 43329006)
23. D. Depla, and R. De Gryse Target poisoning during reactive magnetron sputtering. Part I. The influence of ion implantation Surface and Coatings Technology 183 2004 184 189 (Pubitemid 38616095)
24. D. Depla, and R. De Gryse Target poisoning during reactive magnetron sputtering. Part II. The influence of chemisorption and gettering Surface and Coatings Technology 183 2004 190 195 (Pubitemid 38616096)
25. S. Venkataraj, D. Severin, R. Drese, F. Koerfer, and M. Wuttig Structural, optical and mechanical properties of aluminium nitride films prepared by reactive DC magnetron sputtering Thin Solid Films 502 2006 235 239
26. N Jacobson Use of tabulated thermochemical data for pure compounds Journal of Chemical Education 78 2001 814 (Pubitemid 32544227)
27. R.T. Downs, K.L. Bartelmehs, G.V. Gibbs, and M.B. Boisen Interactive software for calculating and displaying X-ray or neutron powder diffractometer patterns of crystalline materials American Mineralogist 78 1993 1104 1107
28. V.A. Lubarda On the effective lattice parameter of binary alloys Mechanics of Materials 35 2003 53 68
29. F. Vaz, L. Rebouta, P. Goudeau, J.P. Riviere, E. Schaffer, G. Kleer, and M. Bodmann Residual stress states in sputtered Ti1-xSixNy films Thin Solid Films 402 2002 195 202
30. I. Petrov, P.B. Barna, L. Hultman, and J.E. Greene Microstructural evolution during film growth Journal of Vacuum Science and Technology A: Vacuum Surfaces, and Films 21 2003 S117 S128
31. 3 films on GaAs deposited by the e-beam evaporation technique Semiconductor Science and Technology 24 2009 9
32. J. Kolodzey, E.A. Chowdhury, T.N. Adam, Q. Guohua, I. Rau, J.O. Olowolafe, J.S. Suehle, and C. Yuan Electrical conduction and dielectric breakdown in aluminum oxide insulators on silicon IEEE Transactions on Electron Devices 47 2000 121 128