Effect of metal contacts on the electrical characteristics of Al 2O3 dielectric thin films

Applied Physics Letters

Volumn 92, Issue 12, 2008, Pages

  Yip, G ^a   Qiu, J ^a   Ng, W T ^a   Lu, Z H ^a  

^a UNIVERSITY OF TORONTO   (Canada)

Author keywords

[No Author keywords available]

Indexed keywords

CAPACITORS; DIELECTRIC MATERIALS; ELECTRIC BREAKDOWN; ELECTRODES; LEAKAGE CURRENTS;

BREAKDOWN FIELDS; ELECTRODE MATERIAL;

THIN FILMS;

EID: 41349102325     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2903708     Document Type: Article

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