Preparation of high surface area nickel electrodeposit using a liquid crystal template technique

Electrochimica Acta

Volumn 49, Issue 21, 2004, Pages 3561-3572

  Ganesh, V ^a   Lakshminarayanan, V ^a  

^a RAMAN RESEARCH INSTITUTE   (India)

Author keywords

Electrocatalysis; Electrochemical capacitors; Liquid crystalline phase; Nanoparticles; Roughness factor; Template electrodeposition

Indexed keywords

CAPACITORS; CATALYSIS; CYCLIC VOLTAMMETRY; ELECTRODEPOSITION; LIQUID CRYSTALS; NANOSTRUCTURED MATERIALS; SCANNING ELECTRON MICROSCOPY; SCANNING TUNNELING MICROSCOPY; SPECTROSCOPIC ANALYSIS; SURFACE CHEMISTRY;

ELECTROCATALYSIS; ELECTROCHEMICAL CAPACITORS; LIQUID CRYSTALLINE PHASES; NANOPARTICLES; ROUGHNESS FACTORS; TEMPLATE ELECTRODEPOSITION;

ELECTROCHEMISTRY;

EID: 2942555481     PISSN: 00134686     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.electacta.2004.03.024     Document Type: Article

References (42)

1. Attard G.S., Bartlett P.N., Coleman N.R.B., Elliot J.M., Owen J.R., Wang J.H. Science. 278:1997;838.
2. Lee M.H., Geun Oh S., Suh K.D., Kim D.G., Sohn D. Colloids Surf. A. 210:2002;49.
3. Huang L., Wang H., Wang Z., Mitra A., Bozhilov K.N., Yan Y. Adv. Mater. 14:2002;61.
4. Pang Y.X., Bao X. J. Mater. Chem. 12:2002;1. (advanced article).
5. Sotiropoulos S., Brown I.J., Akay G., Lester E. Mater. Lett. 35:1998;383.
6. Attard G.S., Goltner C.G., Corker J.M., Henke S., Templer R.H. Angew. Chem. Int. Ed. Engl. 36:1997;1315.
7. Attard G.S., Glyde J.C., Goltner C.G. Nature. 378:1995;366.
8. Xu S., Li Y. J. Mater. Chem. 12:2002;1. (advanced article).
9. Xiong Y., Xie Y., Yang J., Zhang R., Wu C., Du G. J. Mater. Chem. 12:2002;1. (advanced article).
10. Tanori J., Pileni M.P. Langmuir. 13:1997;639.
11. Yin A.J., Li J., Jain W., Bennett A.J., Xu J.M. App. Phys. Lett. 79:2001;1039.
12. Bartlett P.N., Dunford T., Ghanem M.A. J. Mater. Chem. 12:2002;1. (advanced article).
13. Simpraga R., Tremiliosi-Filho G., Qian S.Y., Conway B.E. J. Electroanal. Chem. 424:1997;141.
14. Rausch S., Wendt H. J. Electrochem. Soc. 143:1996;2852.
15. Brown I.J., Sotiropoulos S. Electrochim. Acta. 46:2001;2711.
16. Nam K.W., Kim K.B. J. Electrochem. Soc. 149:2002;A346.
17. Srinivasan V., Weidner J.W. J. Electrochem. Soc. 147:2000;880.
18. Nam K.W., Yoon W.S., Kim K.B. Electrochim. Acta. 47:2002;3201.
19. Nelson P.A., Owen J.R. J. Electrochem. Soc. 50:2003;A1313.
20. Galatanu A.N., Chronakis I.S., Anghel D.F., Khan A. Langmuir. 16:2000;4922.
21. F.A. Lowenheim, Modern Electroplating, third ed., John Wiley & Sons, New York, 1974, p. 314.
22. Lakshminarayanan V. Curr. Sci. 74:1998;413.
23. C. Hammond, The Basics of Crystallography and Diffraction, Oxford University Press, Oxford, 1997.
24. Tilley R.D., Jefferson D.A. J. Mater. Chem. 12:2002;1. (advanced article).
25. Harrington D.A., Conway B.E. Electrochim. Acta. 32:1987;1703.
26. Hitz C., Lasia A. J. Electroanal. Chem. 500:2001;213.
27. Shervedani R.K., Lasia A. J. Electrochem. Soc. 145:1998;2219.
28. Chen L., Lasia A. J. Electrochem. Soc. 139:1992;3214.
29. Castro E.B., de Giz M.J., Gonzalez E.R., Vilche J.R. Electrochim. Acta. 42:1997;951.
30. de Levie R. J. Electroanal. Chem. 261:1989;1.
31. Keiser H., Beccu K.D., Gutjahr M.A. Electrochim. Acta. 21:1976;539.
32. Hasbach A., Retter U., Siegler K., Kautek W. J. Electroanal. Chem. 561:2004;29.
33. Lakshminarayanan V., Srinivasan R., Chu D., Gilman S. Surf. Sci. 392:1997;44.
34. Beyer K. J. Colloid Interface Sci. 86:1982;73.
35. B.D. Cullity, Elements of X-ray Diffraction, Addison-Wesley, 1956, p. 262.
36. Brown I.J., Sotiropoulos S. J. Appl. Electrochem. 30:2000;107.
37. Angelo A.C.D., Lasia A. J. Electrochem. Soc. 142:1995;3313.
38. Paseka I. Electrochim. Acta. 44:1999;4551.
39. S. Trasatti, in: H. Gerischer, C.W. Tobias (Eds.), Advances in Electrochemical Science and Engineering, vol. 2, VCH, Weinheim, 1992, p. 38.
40. Machado S.A.S., Avaca L.A. Electrochim. Acta. 39:1994;1385.
41. Simpraga R., Conway B.E. Electrochim. Acta. 43:1998;3045.
42. Correia A.N., Machado S.A.S. Electrochim. Acta. 43:1998;367.