Investigation of Niobium oxynitride thin films deposited by reactive magnetron sputtering

Surface and Coatings Technology

Volumn 201, Issue 7 SPEC. ISS., 2006, Pages 4152-4157

  Fenker, M ^a   Kappl, H ^a   Banakh, O ^b   Martin, N ^c   Pierson, J F ^d  

^a Depart of Electrochemistry Research Institute for Precious Metals and Metal Chemistry Fem   (Germany)

^b University of Applied Sciences   (Switzerland)

^c Centre National de la Recherche Scientifique   (France)

^d INSTITUT JEAN LAMOUR   (France)

Author keywords

DC and pulsed power magnetron sputtering; Electrical and optical properties; Niobium oxynitride; PVD

Indexed keywords

ATOMIC FORCE MICROSCOPY; ELECTRIC CONDUCTIVITY OF SOLIDS; ELLIPSOMETRY; MAGNETRON SPUTTERING; MORPHOLOGY; OPTICAL PROPERTIES; OXYGEN; PHYSICAL VAPOR DEPOSITION; REFRACTIVE INDEX; SCANNING ELECTRON MICROSCOPY; THIN FILMS; X RAY DIFFRACTION ANALYSIS;

NIOBIUM OXYNITRIDE; SPECTROSCOPIC ELLIPSOMETRY; TRANSMISSION SPECTROSCOPY; X-RAY AMORPHOUS;

NIOBIUM COMPOUNDS;

ATOMIC FORCE MICROSCOPY; ELECTRIC CONDUCTIVITY OF SOLIDS; ELLIPSOMETRY; MAGNETRON SPUTTERING; MORPHOLOGY; NIOBIUM COMPOUNDS; OPTICAL PROPERTIES; OXYGEN; PHYSICAL VAPOR DEPOSITION; REFRACTIVE INDEX; SCANNING ELECTRON MICROSCOPY; THIN FILMS; X RAY DIFFRACTION ANALYSIS;

EID: 33751267273     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2006.08.104     Document Type: Article

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