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Volumn 46, Issue 24-25, 2001, Pages 3827-3834

Improvement of the electrochemical behaviour of AlN films produced by reactive sputtering using various under-layers

Author keywords

Aluminium nitride; Corrosion protection; Reactive sputtering; Under layer

Indexed keywords

ATOMIC FORCE MICROSCOPY; CORROSION RESISTANCE; ELECTROCHEMISTRY; POROSITY; PROTECTIVE COATINGS; SCANNING ELECTRON MICROSCOPY; SPECTROSCOPIC ANALYSIS; SPUTTERING; STEEL; SUBSTRATES; X RAY DIFFRACTION ANALYSIS;

EID: 0035880409     PISSN: 00134686     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0013-4686(01)00669-7     Document Type: Article
Times cited : (22)

References (16)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.