Ordering, positioning and uniformity of quantum dot arrays

Nano Today

Volumn 7, Issue 2, 2012, Pages 94-123

  Lan, Hongbo ^a,b   Ding, Yucheng ^a  

^a XI'AN JIAOTONG UNIVERSITY   (China)

^b QINGDAO TECHNOLOGICAL UNIVERSITY   (China)

Author keywords

Patterned substrate; Quantum dot arrays; Site control; Uniformity and ordering

Indexed keywords

3RD GENERATION; DEFECT REDUCTION; DEFECT-FREE; FUNCTIONAL DEVICES; HIGH PERFORMANCE DEVICES; HIGH QUALITY; LONG-RANGE ORDERING; NUCLEATION SITES; PATTERNED SUBSTRATES; PHYSICAL PHENOMENA; POTENTIAL APPLICATIONS; QD ARRAYS; QD LASERS; QUANTUM COMPUTING; QUANTUM DOT ARRAYS; REPRODUCIBILITIES; SINGLE PHOTON EMITTERS; UNIFORMITY AND ORDERING;

DEFECTS; OPTOELECTRONIC DEVICES; QUANTUM COMMUNICATION; QUANTUM COMPUTERS; SEMICONDUCTOR QUANTUM DOTS;

QUANTUM OPTICS;

ALUMINUM OXIDE; LIQUID NITROGEN; QUANTUM DOT;

ANISOTROPY; ATOMIC FORCE MICROSCOPY; BLOCK COPOLYMER LITHOGRAPHY; CHEMICAL BEAM EPITAXY; DENSITY; ELECTRON BEAM; ELECTRON BEAM LITHOGRAPHY; ELECTRON DIFFRACTION; METAL ORGANIC CHEMICAL VAPOR DEPOSITION; MOLECULAR IMPRINTING; NANOARRAY; NANOFABRICATION; NANOIMPRINT LITHOGRAPHY; NANOSPHERE LITHOGRAPHY; OPTICAL LITHOGRAPHY; PARTICLE SIZE; PHOTOLITHOTROPH; PHOTOLUMINESCENCE; PHOTON; QUANTUM MECHANICS; REVIEW; SCANNING ELECTRON MICROSCOPY; TRANSMISSION ELECTRON MICROSCOPY; VAPORIZATION; X RAY DIFFRACTION;

EID: 84859430000     PISSN: 17480132     EISSN: 1878044X     Source Type: Journal    
DOI: 10.1016/j.nantod.2012.02.006     Document Type: Review

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