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Volumn 323, Issue 1, 2011, Pages 183-186
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Nanoimprint lithography patterned GaAs templates for site-controlled InAs quantum dots
a
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Author keywords
Low dimensional structures; Molecular beam epitaxy; Nanostructures; Semiconducting IIIV materials; Surface processes; Surface structure
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Indexed keywords
GAAS;
GAAS SURFACES;
INAS QUANTUM DOTS;
LOW DIMENSIONAL STRUCTURE;
NATIVE OXIDE REMOVAL;
NEAR-SURFACE;
OPTICAL QUALITIES;
OPTICALLY ACTIVE;
PHOTOLUMINESCENCE ANALYSIS;
PHOTOLUMINESCENCE SIGNALS;
QUANTUM DOT;
QUANTUM WELL;
SEMI CONDUCTING III-V MATERIALS;
SURFACE PROCESSES;
UV-NANOIMPRINT LITHOGRAPHY;
ATOMIC FORCE MICROSCOPY;
CHEMICAL ANALYSIS;
CHEMICAL BEAM EPITAXY;
CHEMICAL CLEANING;
EPITAXIAL GROWTH;
GALLIUM ALLOYS;
GALLIUM ARSENIDE;
INDIUM ARSENIDE;
MOLECULAR BEAM EPITAXY;
MOLECULAR BEAMS;
NANOIMPRINT LITHOGRAPHY;
PHOTOLUMINESCENCE;
SCANNING ELECTRON MICROSCOPY;
SEMICONDUCTING GALLIUM;
SEMICONDUCTING INDIUM;
SEMICONDUCTOR QUANTUM DOTS;
SEMICONDUCTOR QUANTUM WELLS;
SURFACE CLEANING;
SURFACE STRUCTURE;
QUALITY CONTROL;
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EID: 79958010017
PISSN: 00220248
EISSN: None
Source Type: Journal
DOI: 10.1016/j.jcrysgro.2010.11.165 Document Type: Article |
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Times cited : (38)
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References (20)
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