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Volumn 3, Issue 4, 2011, Pages 1434-1445
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Preparation of ideal molecular junctions: Depositing non-invasive gold contacts on molecularly modified silicon
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Author keywords
[No Author keywords available]
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Indexed keywords
COVALENTLY BONDED;
DESIGN TECHNIQUE;
DIRECT DEPOSITION;
EVAPORATION METHOD;
EXPERIMENTAL APPROACHES;
FLIP CHIP;
GOLD CONTACTS;
JUNCTION STRUCTURE;
LIFTOFF TECHNIQUE;
MODIFIED POLYMER;
MOLECULAR JUNCTION;
MOLECULAR MONOLAYER;
NON-INVASIVE;
PRE-DEPOSITION;
REPRODUCIBILITIES;
SILICON DIODES;
SILICON SURFACES;
DIODES;
DISTILLATION;
ELECTRON ENERGY LEVELS;
GOLD;
GOLD DEPOSITS;
MONOLAYERS;
SEMICONDUCTING SILICON COMPOUNDS;
GOLD COATINGS;
GOLD;
NANOMATERIAL;
SILICON;
CHEMISTRY;
EQUIPMENT;
EQUIPMENT DESIGN;
MICROELECTRODE;
REVIEW;
ULTRASTRUCTURE;
EQUIPMENT DESIGN;
EQUIPMENT FAILURE ANALYSIS;
GOLD;
MICROELECTRODES;
NANOSTRUCTURES;
SILICON;
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EID: 79953755918
PISSN: 20403364
EISSN: 20403372
Source Type: Journal
DOI: 10.1039/c0nr00677g Document Type: Review |
Times cited : (22)
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References (75)
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