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Volumn 121, Issue 35, 1999, Pages 8052-8064

Chemical effects of methyl and methyl ester groups on the nucleation and growth of vapor-deposited aluminum films

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM; ESTER DERIVATIVE; METHYL GROUP;

EID: 0033536458     PISSN: 00027863     EISSN: None     Source Type: Journal    
DOI: 10.1021/ja9835234     Document Type: Article
Times cited : (139)

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    • One must be cautious about such inferences. Literature values for core-level shifts in Al compounds have a wide range, typically ±1 eV (see refs 27 and 28), partly because the values come from spectra taken on bulk materials. Since the present case involves a very thin surface layer of Al-O-C species, it is possible that the formation of isolated, cluster-like surface species would cause the shift to 75 eV relative to ∼74 eV observed for bulk aluminum oxide.
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