Highly stable organic modification of Si(111) surfaces: Towards reacting Si with further functionalities while preserving the desirable chemical properties of full Si-C atop site terminations

Journal of the American Chemical Society

Volumn 130, Issue 29, 2008, Pages 9184-9185

  Puniredd, Sreenivasa Reddy ^a   Assad, Ossama ^a   Haick, Hossam ^a  

^a TECHNION ISRAEL INSTITUTE OF TECHNOLOGY   (Israel)

Author keywords

[No Author keywords available]

Indexed keywords

BROMIDE; CARBON; CHLOROBENZENE; MAGNESIUM; PHOSPHORUS DERIVATIVE; SILICON; SILICON DIOXIDE; TETRAHYDROFURAN;

ALKYLATION; ARTICLE; CHEMICAL BOND; CHEMICAL MODIFICATION; CHEMICAL REACTION; CHLORINATION; MOLECULAR ELECTRONICS; MOLECULE; OXIDATION; TIME OF FLIGHT MASS SPECTROMETRY; X RAY PHOTOELECTRON SPECTROSCOPY;

ALKANES; ALKENES; ALKYNES; ORGANOSILICON COMPOUNDS; SILICON; SURFACE PROPERTIES;

EID: 47749133849     PISSN: 00027863     EISSN: None     Source Type: Journal    
DOI: 10.1021/ja800855s     Document Type: Article

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