Embedded microstructure fabrication using developer-permeability of semi-cross-linked negative resist

Journal of Microelectromechanical Systems

Volumn 19, Issue 5, 2010, Pages 1058-1069

  Hirai, Yoshikazu ^a   Sugano, Koji ^a   Tsuchiya, Toshiyuki ^a   Tabata, Osamu ^a  

^a KYOTO UNIVERSITY   (Japan)

Author keywords

Chemically amplified resist; cross linking reaction; embedded microchannels; microelectromechanical systems (MEMS); microfluidics; photoresist; polymer microstructures; three dimensional microfabrication; UV lithography

Indexed keywords

CHEMICALLY AMPLIFIED RESIST; CROSSLINKING REACTION; EMBEDDED MICROCHANNELS; MICROELECTROMECHANICAL SYSTEMS; POLYMER MICROSTRUCTURES; THREE-DIMENSIONAL MICRO-FABRICATION; UV LITHOGRAPHY;

COMPOSITE MICROMECHANICS; CROSSLINKING; ELECTROMECHANICAL DEVICES; FLUIDIC DEVICES; LITHOGRAPHY; MECHATRONICS; MEMS; MICROANALYSIS; MICROCHANNELS; MICROFABRICATION; MICROFLUIDICS; MICROMACHINING; MICROSTRUCTURE; NEGATIVE RESISTANCE; PHOTORESISTS; POLYMERS; THREE DIMENSIONAL;

EMBEDDED SYSTEMS;

EID: 77957593137     PISSN: 10577157     EISSN: None     Source Type: Journal    
DOI: 10.1109/JMEMS.2010.2067202     Document Type: Article

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