Modeling, simulation and experimental verification of inclined UV lithography for SU-8 negative thick photoresists

Journal of Micromechanics and Microengineering

Volumn 18, Issue 12, 2008, Pages

  Zhu, Zhen ^a   Zhou, Zai Fa ^a   Huang, Qing An ^a   Li, Wei Hua ^a  

^a Southeast University   (China)

Author keywords

[No Author keywords available]

Indexed keywords

DIFFRACTION; EXPERIMENTS; GLASS; LIGHT; LITHOGRAPHY; MACHINE DESIGN; MICROELECTROMECHANICAL DEVICES; MODEL STRUCTURES; PHOTORESISTORS; PHOTORESISTS; REFLECTION; SEMICONDUCTING SILICON COMPOUNDS; SURFACE TREATMENT; THREE DIMENSIONAL; TITANIUM;

ANTIREFLECTION LAYERS; EFFICIENCY OF THE DESIGNS; EXPERIMENTAL VERIFICATIONS; FRESNEL DIFFRACTION THEORIES; GLASS WAFERS; MICRO-ELECTRO-MECHANICAL SYSTEMS; PARAXIAL APPROXIMATIONS; RAPID DEVELOPMENTS; SIMPLE MODELS; SIMULATION RESULTS; THICK PHOTORESISTS; TI FILMS; UV LIGHTS; UV LITHOGRAPHIES; WAFER SURFACES; WET OXIDATIONS;

SILICON WAFERS;

EID: 58149354163     PISSN: 09601317     EISSN: 13616439     Source Type: Journal    
DOI: 10.1088/0960-1317/18/12/125017     Document Type: Article

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