Influence of processing conditions on the thermal and mechanical properties of SU8 negative photoresist coatings

Journal of Micromechanics and Microengineering

Volumn 13, Issue 1, 2003, Pages 80-88

  Feng, Ru ^a   Farris, Richard J ^a  

^a UNIVERSITY OF MASSACHUSETTS   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CROSSLINKING; GLASS TRANSITION; HOLOGRAPHIC INTERFEROMETRY; OPTICAL COATINGS; RESIDUAL STRESSES; SHRINKAGE; THERMAL EXPANSION;

PHOTORESIST COATINGS;

PHOTORESISTS;

EID: 0037231215     PISSN: 09601317     EISSN: None     Source Type: Journal    
DOI: 10.1088/0960-1317/13/1/312     Document Type: Article

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