Study of cross-linking reactions in negative-type thick-film resists

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6153 II, Issue , 2006, Pages

  Sensu, Yoshihisa ^a   Sekiguchi, Atsushi ^a   Kono, Yoshiyuki ^a  

^a Jpn   (Japan)

Author keywords

Chemically amplified negative type resist; Cross linking reaction; Thick film resist

Indexed keywords

COMPUTER SIMULATION; CROSSLINKING; INTEGRATED CIRCUIT MANUFACTURE; MATHEMATICAL MODELS; THICK FILMS;

CHEMICALLY AMPLIFIED NEGATIVE-TYPE RESISTS; CROSS-LINKING REACTIONS; THICK-FILM RESISTS;

PHOTORESISTS;

EID: 33745633604     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.654166     Document Type: Conference Paper

References (13)

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