Surface modification of SU8 photoresist for shrinkage improvement in a monolithic MEMS microstructure

Journal of Micromechanics and Microengineering

Volumn 17, Issue 2, 2007, Pages 207-212

  Chung, C K ^a   Hong, Y Z ^a  

^a NATIONAL CHENG KUNG UNIVERSITY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

HYDROPHILICITY; MEMS; MICROSTRUCTURE; MONOLITHIC INTEGRATED CIRCUITS; NOZZLES; SURFACE TREATMENT;

MONOLITHIC MEMS MICROSTRUCTURE; MONOLITHIC NOZZLE PLATES; POLYMER-POLYMER STRUCTURE; POST-EXPOSURE BAKING (PEB); SHRINKAGE IMPROVEMENT;

PHOTORESISTS;

EID: 34249093006     PISSN: 09601317     EISSN: 13616439     Source Type: Journal    
DOI: 10.1088/0960-1317/17/2/004     Document Type: Article

References (12)

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