A numerical and experimental study on gap compensation and wavelength selection in UV-lithography of ultra-high aspect ratio SU-8 microstructures

Sensors and Actuators, B: Chemical

Volumn 110, Issue 2, 2005, Pages 279-288

  Yang, Ren ^a   Wang, Wanjun ^a  

^a Louisiana State University   (United States)

Author keywords

Cargille refractive index matching liquid; Diffraction; High aspect ratio; MEMS; Ultra thick SU 8 resist; UV lithography

Indexed keywords

ASPECT RATIO; DIFFRACTION; LIGHT; PHOTOLITHOGRAPHY; POLYMETHYL METHACRYLATES; REFRACTIVE INDEX; ULTRAVIOLET RADIATION;

CURGILLE REFRACTIVE INDEX MATCHING LIQUID; HIGH ASPECT RATIO; ULTRA-THICK SU-8 RESIST; UV-LITHOGRAPHY;

MICROSTRUCTURE;

EID: 23844553538     PISSN: 09254005     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.snb.2005.02.006     Document Type: Article

References (11)

1. H. Chang, and Y. Kim UV-LIGA process for high aspect ratio structure using stress barrier and C-shaped etch hole Sens. Actuators A: Phys. 84 2000 342 350
2. Z. Ling, K. Lian, and L. Jian Improved patterning quality of SU-8 microstructures by optimizing the exposure parameters Proc. SPIE 3999 2000 P1019 P1027
3. J. O'Bren, P.J. Hughes, and M. Brunent Advanced photoresist technologies for microsystems J. Micromech. Microeng. 11 2001 353 358
4. J. Zhang, K.L. Tan, G.D. Hong, L.J. Yang, and H.Q. Gong Polymerization optimization of SU-8 photoresist and its applications in microfluidic systems and MEMS J. Micromech. Microeng. 11 2001 20 26
5. C. Lin, G. Lee, B. Chang, and G. Chang A new fabrication process for ultra-thick microfluidic microstructures utilizing SU-8 photoresist J. Micromech. Microeng. 12 2002 590 597
6. P.M. Dentinger, K.L. Krafcik, K.L. Simison, R.P. Janek, and J. Hachman High aspect ratio patterning with a proximity ultraviolet source Microelectr. Eng. 61-62 2002 P1001 P1007
7. John D. Williams, and W. Wang Study on the postbaking process and the effects on ultraviolet lithography of high aspect ratio SU-8 microstructures J. Microlithogr. Microfabric. Microsyst. 3 4 2004 563 568
8. Y.J. Chuang, T.G. Tseng, and W.K. Lin Reduction of diffraction effect of UV exposure on SU-8 negative thick photoresist by air gap elimination Microsyst. Technol. 8 2002 308 313
9. E. Reznikova, V. Namov, J. Mour, Deep photo-lithography characterization of SU-8 resist, HARMS 2003.
10. S.J. Lee, W. Shi, P. Maciel, S.W. Cha, Top-edge profile control for SU-8 structural photoresist, Proceedings of the 15th Biennial University/Government/ Industry Microelectronics Symposium, pp. 389-390, June 30-July 2, 2003, Boise, ID, USA.
11. John D. Williams, and W. Wang Using megasonic development of SU-8 to yield ultra-high aspect ratio microstructures with UV lithography Microsyst. Technol. 10 (10, (December)) 2004 694 698