Variation of absorption coefficient and determination of critical dose of SU-8 at 365 nm

Applied Physics Letters

Volumn 88, Issue 2, 2006, Pages 1-3

  Gaudet, Matthieu ^a   Camart, Jean Christophe ^a   Buchaillot, Lionel ^a   Arscott, Steve ^a  

^a INSTITUT D ELECTRONIQUE   (France)

Author keywords

[No Author keywords available]

Indexed keywords

LIGHT ABSORPTION; PHOTOLITHOGRAPHY; POLYMERIZATION; THICK FILMS; ULTRAVIOLET DEVICES;

ABSORPTION COEFFICIENT; CRITICAL DOSES; CRITICAL EXPOSURE DOSE; NEGATIVE PHOTORESIST SU-8;

PHOTORESISTS;

EID: 30744459090     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2164390     Document Type: Article

References (8)

1. H. Lorenz, M. Despont, N. Fahrni, N. LaBianca, P. Renaud, and P. Vettiger, J. Micromech. Microeng. 7, 121 (1997).
2. M. Nathan, O. Levy, I. Goldfarb, and A. Ruzin, J. Appl. Phys. 94, 7932 (2003).
3. H. Yu, O. Balogun, B. Li, T. W. Murray, and X. Zhang, J. Micromech. Microeng. 14, 1576 (2004).
4. H. Ito and C. G. Wilson, Polym. Eng. Sci. 23, 1012 (1983).
5. N. LaBianca and J. D. Gelorme, Proc. SPIE 2438, 846 (1995).
6. W. H. Teh, U. Durig, U. Drechsler, C. G. Smith, and H.-J. Guntherodt, J. Appl. Phys. 97, 054907 (2005).
7. H. Lorenz, M. Despont, N. Fahrni, J. Brugger, P. Vettiger, and P. Renaud, Sens. Actuators, A 64, 33 (1998).
8. H. R. Philipp and E. A. Taft, Phys. Rev. 120, 37 (1960).