Minute tunnel structure formation with permanent film photoresist

Journal of Photopolymer Science and Technology

Volumn 19, Issue 1, 2006, Pages 57-62

  Misumi, Koichi ^a   Satio, Koji ^a   Yamanouchi, Atsushi ^a   Senzaki, Takahiro ^a   Honma, Hideo ^b  

^a TOKYO OHKA KOGYO CO LTD   (Japan)

^b KANTO GAKUIN UNIVERSITY   (Japan)

Author keywords

Chemically amplified resist; Dry film photo resist permanent photoresist; Epoxy resin; Micro channel; Micro electro mechanical systems (MEMS); Micro machining; Packaging; Thick film

Indexed keywords

EID: 33746915998     PISSN: 09149244     EISSN: 13496336     Source Type: Journal    
DOI: 10.2494/photopolymer.19.57     Document Type: Article

References (4)

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4. Wei and Joshi, IEEE CPMT, Vol. 26 (2003) p.p. 55-61.