Rapid fabrication process for high aspect-ratio embedded microchannels with orifices using a single SU-8 layer on a mask

Proceedings of the IEEE International Conference on Micro Electro Mechanical Systems (MEMS)

Volumn 2006, Issue , 2006, Pages 346-349

  Suzuki, T ^a   Tokuda, T ^a   Yamamoto, H ^a   Ohoka, M ^b   Kanno, I ^a   Washizu, M ^c   Kotera, H ^a  

^a KYOTO UNIVERSITY   (Japan)

^b Kyoto Institute of Technology   (Japan)

^c UNIVERSITY OF TOKYO   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ASPECT RATIO; MASKS; ORIFICES; PHOTOLITHOGRAPHY; PHOTORESISTS;

EMBEDDED MICROCHANNELS; MICRO-ORIFICES; UV LITHOGRAPHY;

MICROELECTROMECHANICAL DEVICES;

EID: 33750097200     PISSN: 10846999     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (8)

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