SU-8: A low-cost negative resist for MEMS

Journal of Micromechanics and Microengineering

Volumn 7, Issue 3, 1997, Pages 121-124

  Lorenz, H ^a   Despont, M ^b   Fahrni, N ^a   LaBianca, N ^c   Renaud, P ^a   Vettiger, P ^b  

^a EPFL   (Switzerland)

^b IBM RESEARCH ZURICH   (Switzerland)

^c IBM T J WATSON RESEARCH CENTER   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ASPECT RATIO; COST EFFECTIVENESS; MICROELECTROMECHANICAL DEVICES; ULTRAVIOLET RADIATION;

NEGATIVE PHOTORESISTS;

PHOTORESISTS;

EID: 0031221057     PISSN: 09601317     EISSN: None     Source Type: Journal    
DOI: 10.1088/0960-1317/7/3/010     Document Type: Article

References (5)

1. Lee K Y, LaBianca N, Zolgharnain S, Rishton S A, Gelorme J D, Shaw J M and Chang T H P 1995 J. Vac. Sci Technol. B 13 3012-6
2. Harmening M, Bacher W, Bley P, Kholi A, Kalb H, Kowanz B, Michel A and Mohr J 1992 Proc. IEEE MEMS '92 (Travemünde, 1992) pp 202-7
3. Bischofberger R, Zimmermann H and Staufert G 1996 Low-cost HARMS-process Proc. Eurosensors X (Leuven, 1996) (KU Leuven) pp 303-6
4. Schlesinger S I 1974 Polym. Eng. Sci. 14 387-93
5. Passeraub P A, Rey-Mermet G, Besse P A, Lorenz H and Popovic R S 1996 Proc. Eurosensors X (Leuven, 1996) (KU Leuven) pp 375-8