Moving mask UV lithography for three-dimensional structuring

Journal of Micromechanics and Microengineering

Volumn 17, Issue 2, 2007, Pages 199-206

  Hirai, Yoshikazu ^a   Inamoto, Yoshiteru ^a   Sugano, Koji ^a   Tsuchiya, Toshiyuki ^a   Tabata, Osamu ^a  

^a KYOTO UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; FILM THICKNESS; PHOTORESISTS; ULTRAVIOLET RADIATION; X RAY LITHOGRAPHY;

POSITIVE-TONE PHOTORESIST; UV LITHOGRAPHY;

MICROSTRUCTURE;

EID: 34249060317     PISSN: 09601317     EISSN: 13616439     Source Type: Journal    
DOI: 10.1088/0960-1317/17/2/003     Document Type: Article

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