Moving-mask UV lithography for 3-dimensional positive- and negative-tone thick photoresist microstructuring

TRANSDUCERS and EUROSENSORS '07 - 4th International Conference on Solid-State Sensors, Actuators and Microsystems

Volumn , Issue , 2007, Pages 545-548

  Hirai, Y ^a   Inamoto, Y ^a   Sugano, K ^a   Tsuchiya, T ^a   Tabata, O ^a  

^a KYOTO UNIVERSITY   (Japan)

Author keywords

3 dimensional microfabrication; Simulation; Thick photoresist; UV lithography

Indexed keywords

ACTUATORS; DISSOLUTION; LITHOGRAPHY; MICROSYSTEMS; NANOFLUIDICS; PHOTORESISTORS; SENSORS; SURFACE TREATMENT; THREE DIMENSIONAL; TRANSDUCERS; TURBULENT FLOW;

3-DIMENSIONAL; 3-DIMENSIONAL MICROFABRICATION; DEVELOPMENT PROCESSES; FAST MARCHING METHOD; INTERNATIONAL CONFERENCES; MICROFLUIDIC STRUCTURES; MICROSTRUCTURING; NEGATIVE TONES; NOVEL METHODS; SIMULATION; SIMULATION APPROACH; SOLID-STATE SENSORS; SYSTEMATIC STUDY; THICK PHOTORESIST; THICK PHOTORESISTS; UV LITHOGRAPHY;

PHOTORESISTS;

EID: 50049095041     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/SENSOR.2007.4300188     Document Type: Conference Paper

References (7)

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6. J. A. Sethian, Level Set Methods and Fast Marching Methods, Cambridge University Press, 1999.
7. Y. Hirai et al., J. Micromech. Microeng., Vol.17, pp.199-206, 2007.