Extreme ultraviolet and x-ray resist: Comparison study

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 17, Issue 6, 1999, Pages 3379-3383

  He, D ^a   Solak, H ^a   Li, W ^a   Cerrina, F ^a  

^a UNIVERSITY OF WISCONSIN MADISON   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0038929412     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.591014     Document Type: Article

References (13)

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