Moore's law: past, present, and future

IEEE Spectrum

Volumn 34, Issue 6, 1997, Pages

  Schaller, Robert R ^a  

^a GEORGE MASON UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ECONOMIC AND SOCIAL EFFECTS; INDUSTRIAL APPLICATIONS; PRODUCTION ENGINEERING; SEMICONDUCTING SILICON; TECHNOLOGICAL FORECASTING;

MOORE LAW; OXIDE MASKING PROCESS; PLANARIZATION;

SEMICONDUCTOR DEVICE MANUFACTURE;

EID: 0031166167     PISSN: 00189235     EISSN: None     Source Type: Journal    
DOI: 10.1109/6.591665     Document Type: Article

References (2)

1. G. E. Moore G. E. Moore Cramming More Components Onto Integrated Circuits Electronics Magazine 38 8 114 117 19 April 1965
2. G. E. Moore Lithography and the Future of Moore's Law Optical/Laser Microlithography VIII: Proceedings of the SPIE 2440 2 17 Optical/Laser Microlithography VIII: Proceedings of the SPIE 1995-Feb.-20