A new beamline for EUV lithography research

AIP Conference Proceedings

Volumn 521, Issue , 2000, Pages 99-103

  Solak, H H ^a   Li, W ^a   He, D ^a   Wallace, J ^a   Cerrina, F ^a  

^a UNIVERSITY OF WISCONSIN MADISON   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EXTREME ULTRAVIOLET LITHOGRAPHY; MIRRORS; MULTILAYERS; SYNCHROTRON RADIATION; WIGGLERS;

BEAM LINES; GRATING MONOCHROMATOR; HIGH FLUX; MONOCHROMATIC BEAM; MULTI-LAYER MIRRORS; NEW BRANCHES; UNIFORM AREAS;

SYNCHROTRONS;

EID: 0012714696     PISSN: 0094243X     EISSN: 15517616     Source Type: Conference Proceeding    
DOI: 10.1063/1.1291766     Document Type: Conference Paper

References (4)

1. Y. Vladimirsky, ed. Emerging Lithographic Technologies III, SPIE 3331, 1998.
2. M. C. Hettrick, J. H. Underwood. Appl. Opt. 25, 423 (1986).
3. H. H. Solak, D. He, W. Li, F. Cerrina, B. H. Sohn, X. M. Yang, P. Nealey Appl. Phys. Lett. 75 2328 (1999).
4. T. A. Savas, M. L. Schattenburgh, J. M. Carter, and H. I. Smith. J. Vac. Sci. Technol. B 14, 4167 (1996).