SCOPUS 정보 검색 플랫폼

Volumn 18, Issue 5, 2005, Pages 647-654

EUV resist screening: Current performance and issues

a IMEC (Belgium)

Author keywords

Acid diffusion; EUV lithography; EUV resists; Line edge roughness; Linewidth roughness; Resist sensitivity

Indexed keywords

EID: 22144432263 PISSN: 09149244 EISSN: None Source Type: Journal
DOI: 10.2494/photopolymer.18.647 Document Type: Article

Times cited : (20)

References (13)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.