EUV interferometric lithography for resist characterization

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3676, Issue I, 1999, Pages 278-282

  Solak, H H ^a   He, D ^a   Li, W ^a   Cerrina, F ^a   Sohn, B H ^a   Yang, X ^a   Nealey, P ^a  

^a UNIVERSITY OF WISCONSIN MADISON   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

IMAGE QUALITY; IMAGING TECHNIQUES; INTERFEROMETRY; LIGHT ABSORPTION; MIRRORS; ULTRAVIOLET RADIATION;

EXTREME ULTRAVIOLET LITHOGRAPHY (EUVL); INTERFEROMETRIC LITHOGRAPHY; LLOYD MIRROR INTERFEROMETRY METHOD; UNDULATORS;

PHOTORESISTS;

EID: 0032631898     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.351099     Document Type: Conference Paper

References (15)