Testing extreme ultraviolet optics with visible-light and extreme ultraviolet interferometry

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 20, Issue 6, 2002, Pages 2834-2839

  Goldberg, Kenneth A ^a   Naulleau, Patrick ^a   Bokor, Jeffrey ^a,b   Chapman, Henry N ^c   Barty, Anton ^c  

^a LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

^b UNIVERSITY OF CALIFORNIA   (United States)

^c LAWRENCE LIVERMORE NATIONAL LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DIFFRACTION; IMAGE QUALITY; INTERFEROMETRY; LITHOGRAPHY; OPTICAL DEVICES; ULTRAVIOLET RADIATION; X RAY OPTICS;

SURFACE FIGURE QUALITY; ULTRAHIGH ACCURACY WAVE FRONT METROLOGY TOOLS; ULTRAVIOLET INTERFEROMETRY; ULTRAVIOLET OPTICS;

OPTICAL SYSTEMS;

EID: 0036883167     PISSN: 0734211X     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1523401     Document Type: Article

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