Imaging interferometric lithography: Approaching the resolution limits of optics

Optics Letters

Volumn 24, Issue 3, 1999, Pages 124-126

  Chen, Xiaolan ^a   Brueck, S R J ^a  

^a University of New Mexico   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHROMIUM; DIFFRACTION GRATINGS; FOURIER OPTICS; FOURIER TRANSFORMS; GAS LASERS; INTERFEROMETRY; MASKS; OPTICAL RESOLVING POWER; OPTICAL SYSTEMS; OPTICAL TRANSFER FUNCTION; SILICON WAFERS;

AERIAL IMAGE INTENSITY; IMAGING INTERFEROMETRIC LITHOGRAPHY; LOW PASS SPATIAL FREQUENCY; RESOLUTION LIMITS;

LITHOGRAPHY;

EID: 0033070956     PISSN: 01469592     EISSN: None     Source Type: Journal    
DOI: 10.1364/OL.24.000124     Document Type: Article

References (10)

1. L. W. Liebmann, B. Grenon, M. Lavin, S. Schomody, and T. Zell, Proc. SPIE 2322, 229 (1994).
2. M. D. Levenson, N. S. Viswanathan, and R. A. Simpson, IEEE Trans. Electron. Dev. ED-29, 1828 (1982).
3. K. Kamon, T. Miyamoto, Y. Myoi, H. Nagata, M. Tanaka, and K. Horie, Jpn. J. Appl. Phys. 30, 3021 (1991).
4. E. H. Anderson, C. M. Horowitz, and H. I. Smith, Appl. Phys. Lett. 43, 874 (1983).
5. S. H. Zaidi and S. R. J. Brueck, J. Vac. Sci. Technol. B 11, 658 (1993).
6. X. Chen, S. H. Zaidi, S. R. J. Brueck, and D. J. Devine, J. Vac. Sci. Technol. B 14, 3339 (1996).
7. S. R. J. Brueck, Microlithogr. World 7(1), 2 (1998).
8. X. Chen, and S. R. J. Brueck, Proc. SPIE 3331, 214 (1998).
9. X. Chen, and S. R. J. Brueck, J. Vac. Sci. Technol. 1316, 3392 (1998).
10. J. W. Goodman, Introduction to Fourier Optics, 2nd ed. (McGraw-Hill, New York, 1996).