SCOPUS 정보 검색 플랫폼

Journal of the Korean Physical Society

Volumn 48, Issue 1, 2006, Pages 5-17

Atomic layer deposition of ultrathin metal-oxide films for nano-scale device applications

(2) Kim, Hyoungsub a McIntyre, Paul C b

a Sungkyunkwan University (South Korea)

b Stanford University (United States)

Author keywords

Atomic layer deposition; Ge transistor; High k dielectrics; Nanotube; Nanowire; Si transistor

Indexed keywords

EID: 32044439144 PISSN: 03744884 EISSN: None Source Type: Journal
DOI: None Document Type: Article

Times cited : (61)

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