Progress toward 10 nm CMOS devices

Technical Digest - International Electron Devices Meeting

Volumn , Issue , 1998, Pages 615-618

  Timp, G ^a   Bourdelle, K K ^a   Bower, J E ^a   Baumann, F H ^a   Boone, T ^a   Cirelli, R ^a   Evans Lutterodt, K ^a   Garno, J ^a   Ghetti, A ^a   Gossmann, H ^a   Green, M ^a   Jacobson, D ^a   Kim, Y ^a   Kleiman, R ^a   Klemens, F ^a  

^a LUCENT TECHNOLOGIES   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

BORON; DIFFUSION IN SOLIDS; ETCHING; GATES (TRANSISTOR); INTEGRATED CIRCUIT MANUFACTURE; LEAKAGE CURRENTS; MICROPROCESSOR CHIPS; MOSFET DEVICES; NANOTECHNOLOGY; OXIDES; PHOTOLITHOGRAPHY; SEMICONDUCTOR JUNCTIONS;

DRIVE CURRENT SATURATION; GATE OXIDE TUNNELING; ULTRASHALLOW JUNCTIONS;

CMOS INTEGRATED CIRCUITS;

EID: 0032254714     PISSN: 01631918     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (8)