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Volumn 117, Issue 5, 2002, Pages 1931-1934
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Atomic layer deposition of hafnium oxide: A detailed reaction mechanism from first principles
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Author keywords
[No Author keywords available]
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Indexed keywords
ATOMS;
CHEMICAL VAPOR DEPOSITION;
COMPUTATIONAL GEOMETRY;
COMPUTER SIMULATION;
DESORPTION;
FREE ENERGY;
HYDROGEN INORGANIC COMPOUNDS;
MOLECULAR VIBRATIONS;
PROBABILITY DENSITY FUNCTION;
REACTION KINETICS;
STABILITY;
THERMAL EFFECTS;
ATOMIC LAYER DEPOSITION;
DENSITY FUNCTIONAL THEORY;
HAFNIUM OXIDE;
SOFTWARE PACKAGE GAUSSIAN 98;
HAFNIUM COMPOUNDS;
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EID: 0036677581
PISSN: 00219606
EISSN: None
Source Type: Journal
DOI: 10.1063/1.1495847 Document Type: Article |
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Times cited : (106)
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References (17)
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