-
2
-
-
0035671638
-
-
G. Wang, D. Yang, D. Li, Q. Shui, J. Yang and D. Que, Physica B, 308 (2001) 450.
-
(2001)
Physica B
, vol.308
, pp. 450
-
-
Wang, G.1
Yang, D.2
Li, D.3
Shui, Q.4
Yang, J.5
Que, D.6
-
4
-
-
0036640203
-
-
X. Yu, D. Yang, X. Ma, J. Yang, L. Li, and D. Que, J. Appl. Phys., 92 (2002) 188.
-
(2002)
J. Appl. Phys.
, vol.92
, pp. 188
-
-
Yu, X.1
Yang, D.2
Ma, X.3
Yang, J.4
Li, L.5
Que, D.6
-
5
-
-
0038509878
-
-
X. Yu, D. Yang, X. Ma, L. Li and D. Que, Semicond. Sci. Technol., 18 (2003) 399.
-
(2003)
Semicond. Sci. Technol.
, vol.18
, pp. 399
-
-
Yu, X.1
Yang, D.2
Ma, X.3
Li, L.4
Que, D.5
-
6
-
-
0035368143
-
-
von Ammon W, Holzl R, Virbulis J, Dornberger E, Schmolke R and Graf D, J. Crystal Growth, 226 (2001) 19.
-
(2001)
J. Crystal Growth
, vol.226
, pp. 19
-
-
Von Ammon, W.1
Holzl, R.2
Virbulis, J.3
Dornberger, E.4
Schmolke, R.5
Graf, D.6
-
7
-
-
0033345573
-
-
D. Yang, X. Ma, R. Fan, J. Zhang, L. Li and D. Que, Physica B, 273-274 (1999) 308.
-
(1999)
Physica B
, vol.273-274
, pp. 308
-
-
Yang, D.1
Ma, X.2
Fan, R.3
Zhang, J.4
Li, L.5
Que, D.6
-
8
-
-
0000537024
-
-
Q. Sun, K. H. Yao, H. C. Gatos and J. Lagowski, J. Appl. Phys., 71 (1992) 3760.
-
(1992)
J. Appl. Phys.
, vol.71
, pp. 3760
-
-
Sun, Q.1
Yao, K.H.2
Gatos, H.C.3
Lagowski, J.4
-
9
-
-
0015649506
-
-
Y. Yatsurugi, N. Akiyama, Y. Endo and T. Nozaki, J. Electro. Soc., 120 (1973) 975.
-
(1973)
J. Electro. Soc.
, vol.120
, pp. 975
-
-
Yatsurugi, Y.1
Akiyama, N.2
Endo, Y.3
Nozaki, T.4
-
11
-
-
0008627022
-
-
N. V. Denisova, E. I. Zorin, P. V. Pavlov, D. I. Tetelbaum and A. F. Khokholov, Izv. Akad. Nauk SSSR Neorg. Mater., 11 (1975) 2236.
-
(1975)
Izv. Akad. Nauk SSSR Neorg. Mater.
, vol.11
, pp. 2236
-
-
Denisova, N.V.1
Zorin, E.I.2
Pavlov, P.V.3
Tetelbaum, D.I.4
Khokholov, A.F.5
-
12
-
-
36549096641
-
-
A. Hara, T. Fukuda, T. Miyabo and I. Hirai, Appl. Phys. Lett., 54 (1988) 626.
-
(1988)
Appl. Phys. Lett.
, vol.54
, pp. 626
-
-
Hara, A.1
Fukuda, T.2
Miyabo, T.3
Hirai, I.4
-
17
-
-
0028546534
-
-
R. Jones, C. Ewels, J. Goss, J. Miro, P. Deak, S. Oeberg and F. B. Rasmussen, Semicond. Sci. Technol. 9(1994) 2145.
-
(1994)
Semicond. Sci. Technol.
, vol.9
, pp. 2145
-
-
Jones, R.1
Ewels, C.2
Goss, J.3
Miro, J.4
Deak, P.5
Oeberg, S.6
Rasmussen, F.B.7
-
19
-
-
36448999509
-
-
M. W. Qi, S. S. Tan, B. Zhu, P. X. Cai, W. F. Gu, X. M. Xu and T. S. Shi, J. Appl. Phys. 69 (1991) 3775.
-
(1991)
J. Appl. Phys.
, vol.69
, pp. 3775
-
-
Qi, M.W.1
Tan, S.S.2
Zhu, B.3
Cai, P.X.4
Gu, W.F.5
Xu, X.M.6
Shi, T.S.7
-
21
-
-
0033345573
-
-
D. Yang, X. Ma, R. Fan, J. Zhang, L. Li and D. Que, Physica B, 273-274 (1999) 308.
-
(1999)
Physica B
, vol.273-274
, pp. 308
-
-
Yang, D.1
Ma, X.2
Fan, R.3
Zhang, J.4
Li, L.5
Que, D.6
-
23
-
-
0000969926
-
-
C. P. Ewels, R. Jones, S. Oberg, J. Miro and P. Deak, Phys. Rev. Lett. 77 (1996) 865.
-
(1996)
Phys. Rev. Lett.
, vol.77
, pp. 865
-
-
Ewels, C.P.1
Jones, R.2
Oberg, S.3
Miro, J.4
Deak, P.5
-
24
-
-
0035871267
-
-
V. V. Voronkov, M. Porrini, P. Collareta, M. G. Pretto, R. Scala, R. Falster, G. I. Voronkova, A. V. Batunina, V. N. Golovina, L. V. Arapkina, A. S. Guliawva and M. G. Milvidski, J. Appl. Phys. 89 (2001) 4289.
-
(2001)
J. Appl. Phys.
, vol.89
, pp. 4289
-
-
Voronkov, V.V.1
Porrini, M.2
Collareta, P.3
Pretto, M.G.4
Scala, R.5
Falster, R.6
Voronkova, G.I.7
Batunina, A.V.8
Golovina, V.N.9
Arapkina, L.V.10
Guliawva, A.S.11
Milvidski, M.G.12
-
25
-
-
0000358670
-
-
D. Yang, R. Fan, L. Li and D. Que, Appl. Phys. Lett., 68 (1996) 487.
-
(1996)
Appl. Phys. Lett.
, vol.68
, pp. 487
-
-
Yang, D.1
Fan, R.2
Li, L.3
Que, D.4
-
26
-
-
0033906213
-
-
D. Yang, X. Ma, R. Fan, D. Li, J. Zhang, L. Li, D. Que and K. Sumino, Mater. Sci. Eng. B72 (2000) 121.
-
(2000)
Mater. Sci. Eng.
, vol.B72
, pp. 121
-
-
Yang, D.1
Ma, X.2
Fan, R.3
Li, D.4
Zhang, J.5
Li, L.6
Que, D.7
Sumino, K.8
-
27
-
-
21544478166
-
-
D. Yang, J. Lu, L. Li, H. Yao ad D. Que, Appl. Phys. Lett. 59 (1991) 1227.
-
(1991)
Appl. Phys. Lett.
, vol.59
, pp. 1227
-
-
Yang, D.1
Lu, J.2
Li, L.3
Yao, H.4
Que, D.5
-
28
-
-
0001453960
-
-
D. Yang, R. Fan, L. Li, D. Que and K. Sumino, J. Appl. Phys., 80 (1996) 1493.
-
(1996)
J. Appl. Phys.
, vol.80
, pp. 1493
-
-
Yang, D.1
Fan, R.2
Li, L.3
Que, D.4
Sumino, K.5
-
30
-
-
0020821708
-
-
K. Sumino, I. Yonenaga, M. Imai, T. Abe, J. Appl. Phys., 54 (1983) 5016.
-
(1983)
J. Appl. Phys.
, vol.54
, pp. 5016
-
-
Sumino, K.1
Yonenaga, I.2
Imai, M.3
Abe, T.4
-
31
-
-
0032179379
-
-
H. Lu, D. Yang, L. Li, Z. Ye and D. Que, Phys. Stat. Sol. (a), 169 (1998) 193.
-
(1998)
Phys. Stat. Sol. (a)
, vol.169
, pp. 193
-
-
Lu, H.1
Yang, D.2
Li, L.3
Ye, Z.4
Que, D.5
-
32
-
-
0037395360
-
-
Deren Yang, Gan Wang, Jin Xu, Dongsheng Li, Duanlin Que, C. Funke, H.J. Moeller, Microelectron. Eng. 66 (2003) 345.
-
(2003)
Microelectron. Eng.
, vol.66
, pp. 345
-
-
Yang, D.1
Wang, G.2
Xu, J.3
Li, D.4
Que, D.5
Funke, C.6
Moeller, H.J.7
-
33
-
-
0036966307
-
-
V. Orlov, H. Richter, A. Fischer, J. Reif, T. Mueller, R. Wahlich, Mater. Sci. Semi. Proc., 5 (2003) 403.
-
(2003)
Mater. Sci. Semi. Proc.
, vol.5
, pp. 403
-
-
Orlov, V.1
Richter, H.2
Fischer, A.3
Reif, J.4
Mueller, T.5
Wahlich, R.6
-
34
-
-
0000673568
-
-
K. Aihara, H. Takeno, Y. Hayamizu, M. Tamatsuka, and T. Masui, J. Appl. Phys., 88 (2000) 3705.
-
(2000)
J. Appl. Phys.
, vol.88
, pp. 3705
-
-
Aihara, K.1
Takeno, H.2
Hayamizu, Y.3
Tamatsuka, M.4
Masui, T.5
-
35
-
-
0035870960
-
-
K. Nakai, Y. Inoue, H. Yokota, A. Ikari, J. Takahashi, A. Tachikawa, K. Kitahara, Y. Ohta and W. Ohashi, J. Appl. Phys. 89 (2001) 4301.
-
(2001)
J. Appl. Phys.
, vol.89
, pp. 4301
-
-
Nakai, K.1
Inoue, Y.2
Yokota, H.3
Ikari, A.4
Takahashi, J.5
Tachikawa, A.6
Kitahara, K.7
Ohta, Y.8
Ohashi, W.9
-
37
-
-
0036530519
-
-
H. Fujimori, H. Fujisawa, Y. Hirano, T. Okabe, J. Cryst. Growth, 237-239 (2002) 338.
-
(2002)
J. Cryst. Growth
, vol.237-239
, pp. 338
-
-
Fujimori, H.1
Fujisawa, H.2
Hirano, Y.3
Okabe, T.4
-
38
-
-
0037636430
-
-
Deren Yang, Jia Chu, Jin Xu, Duanlin Que, J. Appl. Phys., 93 (2003) 8926.
-
(2003)
J. Appl. Phys.
, vol.93
, pp. 8926
-
-
Yang, D.1
Chu, J.2
Xu, J.3
Que, D.4
-
39
-
-
2942536008
-
-
H. Wang, X. Ma, J. Xu, X. Yu and D. Yang, Semicond. Sci. Technol. 19 (2004) 715.
-
(2004)
Semicond. Sci. Technol.
, vol.19
, pp. 715
-
-
Wang, H.1
Ma, X.2
Xu, J.3
Yu, X.4
Yang, D.5
-
40
-
-
1642516021
-
-
D. Yang, H. Wang, X. Yu, X. Ma, and D. Que, Solid Status phenomena, 95-96 (2004) 111.
-
(2004)
Solid Status Phenomena
, vol.95-96
, pp. 111
-
-
Yang, D.1
Wang, H.2
Yu, X.3
Ma, X.4
Que, D.5
-
41
-
-
0026881311
-
-
H. Shimura, C. Munakata, N. Honma, S. Aoki and Y. Kosaka, Jpn. J. Appl. Phys., 31 (1992) 1817.
-
(1992)
Jpn. J. Appl. Phys.
, vol.31
, pp. 1817
-
-
Shimura, H.1
Munakata, C.2
Honma, N.3
Aoki, S.4
Kosaka, Y.5
-
42
-
-
0029273840
-
-
K. Marsden, S. Sadamitsu, M. Hourai, S. Sumita and T. Shigematsu, J. Electrochem. Soc., 142 (1995) 996.
-
(1995)
J. Electrochem. Soc.
, vol.142
, pp. 996
-
-
Marsden, K.1
Sadamitsu, S.2
Hourai, M.3
Sumita, S.4
Shigematsu, T.5
-
43
-
-
4243124975
-
-
H. One, T. Ikarashi, S. Kimura and A. Tanikawa, J. Appl. Phys., 76 (1994) 621.
-
(1994)
J. Appl. Phys.
, vol.76
, pp. 621
-
-
One, H.1
Ikarashi, T.2
Kimura, S.3
Tanikawa, A.4
-
44
-
-
0037392489
-
-
X. Yu, D. Yang, X. Ma, Y. Shen, D. Tian, L. Li and D. Que, Semicond. Sci. Technol., 18 (2003) 393.
-
(2003)
Semicond. Sci. Technol.
, vol.18
, pp. 393
-
-
Yu, X.1
Yang, D.2
Ma, X.3
Shen, Y.4
Tian, D.5
Li, L.6
Que, D.7
-
48
-
-
0001274178
-
-
M. Itsumi, H. Akiya, T. Ueki, M. Tomita, M. Yamawaki, J. Appl. Phys., 78 (1995) 5984.
-
(1995)
J. Appl. Phys.
, vol.78
, pp. 5984
-
-
Itsumi, M.1
Akiya, H.2
Ueki, T.3
Tomita, M.4
Yamawaki, M.5
-
49
-
-
0031273948
-
-
H. Nishikawa, T. Tanaka, Y. Yanase, H. Tsuya, Jpn. J. Appl. Phys., 36 (1997) 65950.
-
(1997)
Jpn. J. Appl. Phys.
, vol.36
, pp. 65950
-
-
Nishikawa, H.1
Tanaka, T.2
Yanase, Y.3
Tsuya, H.4
-
52
-
-
0347714184
-
-
edited by S. Mahajan et al, (North-Holland)
-
T. Abe, H. Harada, J. Chikawa, in defects in Semiconductor, edited by S. Mahajan et al, (North-Holland), (1983) 1.
-
(1983)
Defects in Semiconductor
, pp. 1
-
-
Abe, T.1
Harada, H.2
Chikawa, J.3
-
53
-
-
0004772713
-
-
D. Graf, U. Lambert, R. Schmolke, R. Wahlich, W. Siebert, E. Daub, W. von Ammon, The Electrochem. Soc. Proc., 2000 (2000) 319.
-
(2000)
The Electrochem. Soc. Proc.
, vol.2000
, pp. 319
-
-
Graf, D.1
Lambert, U.2
Schmolke, R.3
Wahlich, R.4
Siebert, W.5
Daub, E.6
Von Ammon, W.7
-
56
-
-
0037393443
-
-
W. v. Ammon, R. Hoelzl, T. Wetzel, D. Zemke, G. Raming and M. Blietz, Microelectron. Eng., 66 (2003) 234.
-
(2003)
Microelectron. Eng.
, vol.66
, pp. 234
-
-
Ammon, W.V.1
Hoelzl, R.2
Wetzel, T.3
Zemke, D.4
Raming, G.5
Blietz, M.6
-
58
-
-
0042037772
-
-
W. v. Ammon, P. Dreier, W. Hensel, U. Lambert and L. Koester, Mater. Sci. Eng. B36 (1996) 33.
-
(1996)
Mater. Sci. Eng.
, vol.B36
, pp. 33
-
-
Ammon, W.V.1
Dreier, P.2
Hensel, W.3
Lambert, U.4
Koester, L.5
-
60
-
-
0038035203
-
-
X. Yu, D. Yang, X. Ma, D. Que, Microelectronic Engineering, 69 (2003) 97.
-
(2003)
Microelectronic Engineering
, vol.69
, pp. 97
-
-
Yu, X.1
Yang, D.2
Ma, X.3
Que, D.4
-
62
-
-
0035576427
-
-
Q. Shui, D. Yang, L. Li, X. Pi and D. Que, Physica B, 307 (2001) 40.
-
(2001)
Physica B
, vol.307
, pp. 40
-
-
Shui, Q.1
Yang, D.2
Li, L.3
Pi, X.4
Que, D.5
-
63
-
-
1642371417
-
-
C. Cui, D. Yang, X. Yu, X. Ma, L. Li and D. Que, Semicond. Sci. Technol., 19 (2004) 548.
-
(2004)
Semicond. Sci. Technol.
, vol.19
, pp. 548
-
-
Cui, C.1
Yang, D.2
Yu, X.3
Ma, X.4
Li, L.5
Que, D.6
-
64
-
-
0035358633
-
-
H. Goto, L. Pan, M. Tanaka and K. Kashima, Jpn. J. Appl. Phys., 40 (2001) 3944.
-
(2001)
Jpn. J. Appl. Phys.
, vol.40
, pp. 3944
-
-
Goto, H.1
Pan, L.2
Tanaka, M.3
Kashima, K.4
-
65
-
-
70350672927
-
-
X. Ma, X. Yu, R. Fan, and D. Yang, Appl. Phys. Lett., 81 (2002) 496.
-
(2002)
Appl. Phys. Lett.
, vol.81
, pp. 496
-
-
Ma, X.1
Yu, X.2
Fan, R.3
Yang, D.4
-
66
-
-
0038518294
-
-
X. Yu, D. Yang, X. Ma, R. Fan and D. Que, Jpn. J. Appl. Phys., 42 (2003) 1129.
-
(2003)
Jpn. J. Appl. Phys.
, vol.42
, pp. 1129
-
-
Yu, X.1
Yang, D.2
Ma, X.3
Fan, R.4
Que, D.5
-
68
-
-
0036966829
-
-
V. D. Akhmetov, H. Richter, O. Lysytskiy, R. Wahlich and T. Mueller, Mater. Sci. Semi. Pro., 5 (2003) 391.
-
(2003)
Mater. Sci. Semi. Pro.
, vol.5
, pp. 391
-
-
Akhmetov, V.D.1
Richter, H.2
Lysytskiy, O.3
Wahlich, R.4
Mueller, T.5
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