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Substitutional and interstitial oxygen in silicon have principal piezospectroscopic stress tensor elements of 8.8 and (formula presented) per unit strain, respectively. See Ref., and references therein
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Substitutional and interstitial oxygen in silicon have principal piezospectroscopic stress tensor elements of 8.8 and (formula presented) per unit strain, respectively. See Ref. 51, and references therein.
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This expression neglects all but configurational entropic terms
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This expression neglects all but configurational entropic terms.
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Applying equilibrium conditions, the concentration of vacancies at lower temperatures will be reduced and the relative concentration of (formula presented) redecuded commensurately
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Applying equilibrium conditions, the concentration of vacancies at lower temperatures will be reduced and the relative concentration of (formula presented) redecuded commensurately.
-
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