메뉴 건너뛰기




Volumn 14, Issue 1, 2013, Pages 39-56

RF MEMS-CMOS device integration: An overview of the potential for RF researchers

Author keywords

[No Author keywords available]

Indexed keywords

ANALOG DEVICES; CAVENDISH KINETICS; DEVICE INTEGRATION; DIGITAL MICRO-MIRROR DEVICE; MICROMACHINING TECHNIQUES; MONOLITHIC INTEGRATION; RF-MEMS; RF-MEMS SWITCHES; SEMICONDUCTOR MANUFACTURING PROCESS; STMICROELECTRONICS; TEXAS INSTRUMENTS;

EID: 84873358467     PISSN: 15273342     EISSN: None     Source Type: Journal    
DOI: 10.1109/MMM.2012.2226539     Document Type: Review
Times cited : (46)

References (48)
  • 1
    • 84883075791 scopus 로고    scopus 로고
    • H. Baltes, O. Brand, G. K. Fedder C. Hierold, J. G. Korvink, and O. Tabata, Eds. Weinheim, Germany: Wiley-VCH
    • O. Brand and G. K. Fedder, CMOS-MEMS, Advanced Micro and Nanosystems, vol. 2, H. Baltes, O. Brand, G. K. Fedder, C. Hierold, J. G. Korvink, and O. Tabata, Eds. Weinheim, Germany: Wiley-VCH, 2005.
    • (2005) CMOS-MEMS, Advanced Micro and Nanosystems , vol.2
    • Brand, O.1    Fedder, G.K.2
  • 2
    • 33847028640 scopus 로고    scopus 로고
    • Microsensor integration into systems-on-chip
    • June
    • O. Brand, "Microsensor integration into systems-on-chip," Proc. IEEE, vol. 94, no. 6, pp. 1160-1176, June 2006.
    • (2006) Proc. IEEE , vol.94 , Issue.6 , pp. 1160-1176
    • Brand, O.1
  • 3
    • 54049083519 scopus 로고    scopus 로고
    • Technologies for co-fabricating MEMS and electronics
    • June
    • G. K. Fedder, R. T. Howe, T. K. Liu, and E. P. Quevy, "Technologies for co-fabricating MEMS and electronics," Proc. IEEE, vol. 94, no. 6, pp. 306-322, June 2006.
    • (2006) Proc. IEEE , vol.94 , Issue.6 , pp. 306-322
    • Fedder, G.K.1    Howe, R.T.2    Liu, T.K.3    Quevy, E.P.4
  • 4
    • 0039784133 scopus 로고    scopus 로고
    • Integarted MEMS technologies
    • A. E. Franke, T. King, and R. T. Howe, "Integarted MEMS technologies," MRS Bulletin, vol 26, no. 4, pp. 291-295, 2001.
    • (2001) MRS Bulletin , vol.26 , Issue.4 , pp. 291-295
    • Franke, A.E.1    King, T.2    Howe, R.T.3
  • 5
    • 84873358168 scopus 로고    scopus 로고
    • Analog Devices [Online]
    • Analog Devices. (2012). [Online]. Available: http://www.analog.com
    • (2012)
  • 6
    • 84869016221 scopus 로고    scopus 로고
    • From MEMS-CMOS towards heterogeneous integration over scale
    • H. Fujita, H. Toshiyoshi, and T. Ishida, "From MEMS-CMOS towards heterogeneous integration over scale," ECS Transactions, vol. 45, no. 6, pp. 93-99, 2012.
    • (2012) ECS Transactions , vol.45 , Issue.6 , pp. 93-99
    • Fujita, H.1    Toshiyoshi, H.2    Ishida, T.3
  • 7
    • 84873394734 scopus 로고    scopus 로고
    • [Online]
    • SiTime. 2012. [Online]. Available: http://www.sitime.com
    • (2012) SiTime.
  • 8
    • 84873366417 scopus 로고    scopus 로고
    • [Online]
    • Cavendish Kinetics. (2012). [Online]. Available: http://www.cavendish- kinetics.com
    • (2012) Cavendish Kinetics
  • 9
    • 84873357992 scopus 로고    scopus 로고
    • [Online]
    • WiSpry. [Online]. Available: http://www.wispry.com
    • WiSpry
  • 10
    • 70449786959 scopus 로고    scopus 로고
    • Versatile MEMS and mems integration technology platforms for cost effective MEMS development
    • June
    • P. Pieters, "Versatile MEMS and mems integration technology platforms for cost effective MEMS development," in Proc. Microelectronics Packaging Conf., June 2009, pp. 1-5.
    • (2009) Proc. Microelectronics Packaging Conf. , pp. 1-5
    • Pieters, P.1
  • 11
    • 78650418218 scopus 로고    scopus 로고
    • Piezoresistive position sensing for the detection of hysteresis and dielectric charging in CMOS-MEMS variable capacitors
    • Dec.
    • N. Zahirovic, R. R. Mansour, and M. Yu, "Piezoresistive position sensing for the detection of hysteresis and dielectric charging in CMOS-MEMS variable capacitors," IEEE Trans. Microwave Theory Tech., vol. 58, no. 12, pp. 3961-3970, Dec. 2010.
    • (2010) IEEE Trans. Microwave Theory Tech. , vol.58 , Issue.12 , pp. 3961-3970
    • Zahirovic, N.1    Mansour, R.R.2    Yu, M.3
  • 13
    • 84860577831 scopus 로고    scopus 로고
    • Temperature compensation in integrated cmos-MEMS scanning probe microscopes
    • Apr.
    • N. Sarkar, K. Trainor, and R. R. Mansour, "Temperature compensation in integrated cmos-MEMS scanning probe microscopes," IET Micro Nano Lett., vol. 7, no. 4. pp. 297-300, Apr. 2012.
    • (2012) IET Micro Nano Lett. , vol.7 , Issue.4 , pp. 297-300
    • Sarkar, N.1    Trainor, K.2    Mansour, R.R.3
  • 15
    • 0029489783 scopus 로고
    • Embedded micromechanical devices for the monolithic integration of MEMS with CMOS
    • J. Smith, S. Montague, J. Sniegowski, J. Murray, and P. McWhorter, "Embedded micromechanical devices for the monolithic integration of MEMS with CMOS," in Proc. IEEE IEDM, 1995, pp. 609-612.
    • (1995) Proc. IEEE IEDM , pp. 609-612
    • Smith, J.1    Montague, S.2    Sniegowski, J.3    Murray, J.4    McWhorter, P.5
  • 17
    • 0344088287 scopus 로고    scopus 로고
    • Polycrystalline silicongermanium films for integrated microstructures
    • A. E. Franke, J. M. Heck, T.-J. King, and R. T. Howe, "Polycrystalline silicongermanium films for integrated microstructures, " J. Microelectromech. Syst., vol. 12, no. 2, pp. 160-171, 2003.
    • (2003) J. Microelectromech. Syst. , vol.12 , Issue.2 , pp. 160-171
    • Franke, A.E.1    Heck, J.M.2    King, T.-J.3    Howe, R.T.4
  • 22
    • 64549110845 scopus 로고    scopus 로고
    • Evaluation of an O2 plasma and XeF2 vapor Etch release process for RF MEMS, Switches fabricated using CMOS interconnect processes
    • June
    • C. V. Jahnes, N. Hoivik, J. M. Cotte, M. Lu, and J. H. Magerlein, "Evaluation of an O2 plasma and XeF2 vapor Etch release process for RF MEMS, Switches fabricated using CMOS interconnect processes," in Proc. Solid State Sensors, Actuators, Microsystems Workshop, June 2006, pp. 360-363.
    • (2006) Proc. Solid State Sensors, Actuators, Microsystems Workshop , pp. 360-363
    • Jahnes, C.V.1    Hoivik, N.2    Cotte, J.M.3    Lu, M.4    Magerlein, J.H.5
  • 23
    • 0024737710 scopus 로고
    • New approach for the fabrication of micromechanical structures
    • DOI 10.1016/0250-6874(89)87080-5
    • M. Parameswaran, H. P. Baltes, L. J. Ristic, A. C. Dhaded, and A. M. Robinson, "A new approach for the fabrication of micromechanical structures," Sens. Actuators, vol. 19, no. 3, pp. 289-307, 1989. (Pubitemid 20597853)
    • (1989) Sensors and actuators , vol.19 , Issue.3 , pp. 289-307
    • Parameswaran, M.1    Baltes, H.P.2    Ristic, Lj.3    Dhaded, A.C.4    Robinson, A.M.5
  • 25
    • 0036540106 scopus 로고    scopus 로고
    • Post-CMOS processing for high-aspect-ratio integrated silicon microstructures
    • DOI 10.1109/84.993443, PII S1057715702023417
    • X. Huikai Xie, L. Erdmann, X. Zhu, K. J. Gabriel, and G. K. Fedder, "Post-CMOS processing for high-aspect-ratio integrated silicon microstructures," J. Microelectromechnical Syst., vol. 11, no. 2, pp. 93-101, Apr. 2002. (Pubitemid 34515165)
    • (2002) Journal of Microelectromechanical Systems , vol.11 , Issue.2 , pp. 93-101
    • Xie, H.1    Erdmann, L.2    Zhu, X.3    Gabriel, K.J.4    Fedder, G.K.5
  • 26
    • 0036504120 scopus 로고    scopus 로고
    • Micromachined high-Q inductors in a 0.18-μm Cu interconnect low-k dielectric CMOS process
    • H. Lakdawala, X. Zhu, H. Luo, S. Santhanam, L. R. Carley, and G. K. Fedder, "Micromachined high-Q inductors in a 0.18-μm Cu interconnect low-k dielectric CMOS process," IEEE J. Solid-State Circuits, vol. 37, no. 3, pp. 349-403, 2002.
    • (2002) IEEE J. Solid-State Circuits , vol.37 , Issue.3 , pp. 349-403
    • Lakdawala, H.1    Zhu, X.2    Luo, H.3    Santhanam, S.4    Carley, L.R.5    Fedder, G.K.6
  • 29
    • 38849202431 scopus 로고    scopus 로고
    • Novel high-Q MEMS curled-plate variable capacitors fabricated in 0.35-μm CMOS technology
    • DOI 10.1109/TMTT.2007.914657
    • M. Bakri-Kassem, S. Fouladi, and R. R. Mansour, "Novel High-Q MEMS curled-plate variable capacitors fabricated in 0.35-m CMOS technology," IEEE Trans. Microwave Theory Tech., vol. 56, no. 2, pp. 530-541, Feb. 2008. (Pubitemid 351207485)
    • (2008) IEEE Transactions on Microwave Theory and Techniques , vol.56 , Issue.2 , pp. 530-541
    • Bakri-Kassem, M.1    Fouladi, S.2    Mansour, R.R.3
  • 30
    • 76849102304 scopus 로고    scopus 로고
    • Capacitive RF MEMS switches fabricated in standard 0.35μm CMOS Technology
    • Feb.
    • S. Fouladi and R. R. Mansour, "Capacitive RF MEMS switches fabricated in standard 0.35μm CMOS Technology," IEEE Trans. Microwave Theory Techn., vol. 58, no. 2, pp. 478-486, Feb. 2010.
    • (2010) IEEE Trans. Microwave Theory Techn. , vol.58 , Issue.2 , pp. 478-486
    • Fouladi, S.1    Mansour, R.R.2
  • 32
    • 34748849558 scopus 로고    scopus 로고
    • An integrated tunable band-pass filter using MEMS parallel-plate variable capacitors implemented with 0.35μm CMOS technology
    • DOI 10.1109/MWSYM.2007.380518, 4263861, 2007 IEEE MTT-S International Microwave Symposium Digest
    • S. Fouladi, M. Bakri-Kassem, and R. Mansour, "An integrated tunable band-pass filter using MEMS parallel-plate variable capacitors implemented with 0.35μm CMOS technology," in Proc. IEEE Int. Microwave Symp., June 2007, pp. 505-508. (Pubitemid 47486051)
    • (2007) IEEE MTT-S International Microwave Symposium Digest , pp. 505-508
    • Fouladi, S.1    Bakri-Kassem, M.2    Mansour, R.R.3
  • 33
    • 77951170209 scopus 로고    scopus 로고
    • Distributed MEMS tunable impedance-matching network based on suspended slow-wave structure fabricated in a standard CMOS technology
    • Apr.
    • S. Fouladi, F. Domingue, N. Zahirovic, and R. R. Mansour, "Distributed MEMS tunable impedance-matching network based on suspended slow-wave structure fabricated in a standard CMOS technology," IEEE Trans. Microwave Theory Tech., vol. 58, no. 4, pp. 1056-1064, Apr. 2010.
    • (2010) IEEE Trans. Microwave Theory Tech. , vol.58 , Issue.4 , pp. 1056-1064
    • Fouladi, S.1    Domingue, F.2    Zahirovic, N.3    Mansour, R.R.4
  • 39
    • 52049096399 scopus 로고    scopus 로고
    • Wideband CMOS compatible capacitive MEMS switch for RF applications
    • Sept.
    • S. Zhang, W. Su, M. Zaghloul, and B. Thibeault, "Wideband CMOS compatible capacitive MEMS switch for RF applications," IEEE Microwave Wireless compon. Lett., vol. 18, no 9. pp. 599-601, Sept. 2008.
    • (2008) IEEE Microwave Wireless Compon. Lett. , vol.18 , Issue.9 , pp. 599-601
    • Zhang, S.1    Su, W.2    Zaghloul, M.3    Thibeault, B.4
  • 41
    • 77957593436 scopus 로고    scopus 로고
    • CMOS-MEMS variable capacitors using electrothermal actuation
    • Oct.
    • J. Reinke, G. K. Fedder, and T. Mukherjee, "CMOS-MEMS variable capacitors using electrothermal actuation," J. Microelectromech. Syst., vol. 19, no. 5, pp. 1105-1115, Oct. 2010.
    • (2010) J. Microelectromech. Syst. , vol.19 , Issue.5 , pp. 1105-1115
    • Reinke, J.1    Fedder, G.K.2    Mukherjee, T.3
  • 42
    • 79955948083 scopus 로고    scopus 로고
    • CMOS-MEMS 3-bit digital capacitors with tuning ratios greater than 60:1
    • May
    • J. Reinke, G. K. Fedder, and T. Mukherjee, "CMOS-MEMS 3-bit digital capacitors with tuning ratios greater than 60:1," IEEE Trans. Microwave Theory Tech., vol. 59, no. 5, pp. 1238-1248, May 2011.
    • (2011) IEEE Trans. Microwave Theory Tech. , vol.59 , Issue.5 , pp. 1238-1248
    • Reinke, J.1    Fedder, G.K.2    Mukherjee, T.3
  • 43
    • 84873341170 scopus 로고    scopus 로고
    • Reconfigurable amplifier with tunable impedance matching networks based on CMOS-MEMS capacitors in 0.18-um CMOS technology
    • Oct.
    • S. Fouladi and R. R. Mansour, "Reconfigurable amplifier with tunable impedance matching networks based on CMOS-MEMS capacitors in 0.18-um CMOS technology," in Proc. 2nd Microsystems Nanoelectronics Research Conf., Oct. 2009, pp. 33-36.
    • (2009) Proc. 2nd Microsystems Nanoelectronics Research Conf. , pp. 33-36
    • Fouladi, S.1    Mansour, R.R.2
  • 44
    • 77952770590 scopus 로고    scopus 로고
    • A generalized foundry CMOS platform for capactively transduced resoantors monolithically integrated with amplifiers
    • W. Chen, C. Sheng, W. Fang, and K.-A. Wen, "A generalized foundry CMOS platform for capactively transduced resoantors monolithically integrated with amplifiers," in Proc. IEEE 23rd Int. Conf. Micro Electro Mechanical Systems, 2010, pp. 204-207.
    • (2010) Proc. IEEE 23rd Int. Conf. Micro Electro Mechanical Systems , pp. 204-207
    • Chen, W.1    Sheng, C.2    Fang, W.3    Wen, K.-A.4
  • 45
    • 84861908976 scopus 로고    scopus 로고
    • High-Q integrated CMOS-MEMS resonators with deep-submicrometer gaps and quasi-linear frequency tuning
    • June
    • W. Chen, W. Fang, and S. Li, "High-Q integrated CMOS-MEMS resonators with deep-submicrometer gaps and quasi-linear frequency tuning," J. Microelectromechanical Syst., vol. 21, no. 3, pp. 688-701, June 2012.
    • (2012) J. Microelectromechanical Syst. , vol.21 , Issue.3 , pp. 688-701
    • Chen, W.1    Fang, W.2    Li, S.3
  • 46
    • 84944678241 scopus 로고    scopus 로고
    • Forced oscillation and higher harmonic detection in an integrated CMOS-MEMS scanning probe microscope
    • N. Sarkar, R. R. Mansour, and K. Trainor, "Forced oscillation and higher harmonic detection in an integrated CMOS-MEMS scanning probe microscope," in Proc. Hilton Head Workshop, 2012, pp. 308-310.
    • (2012) Proc. Hilton Head Workshop , pp. 308-310
    • Sarkar, N.1    Mansour, R.R.2    Trainor, K.3
  • 47
    • 84873352183 scopus 로고    scopus 로고
    • University of Waterloo [Online]
    • University of Waterloo. (2012). [Online]. Available: www.cirfe. uwaterloo.ca
    • (2012)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.