-
1
-
-
0003135925
-
Poly SiGe, a promising material for MEMS post-processing on top of standard CMOS wafers
-
S. Sedky, et al., 'Poly SiGe, a promising material for MEMS post-processing on top of standard CMOS wafers', in Proc. Transducers 2001, pp. 988-991.
-
(2001)
Proc. Transducers
, pp. 988-991
-
-
Sedky, S.1
-
2
-
-
0036544469
-
Poly SiGe, a Promising Material for Monolithic Integration With the Driving Electronics
-
S. Sedky, et al., 'Poly SiGe, a Promising Material for Monolithic Integration With the Driving Electronics', Sensors and Actuators A, Vol.97-98, pp. 503-511, 2002.
-
(2002)
Sensors and Actuators A
, vol.97-98
, pp. 503-511
-
-
Sedky, S.1
-
3
-
-
0035249549
-
Experimental determination of the maximum post-process annealing temperature for standard CMOS wafers
-
S. Sedky, et al., "Experimental determination of the maximum post-process annealing temperature for standard CMOS wafers", IEEE Trans. on Electron Devices, Vol. 48(2), pp. 377-385, 2001.
-
(2001)
IEEE Trans. on Electron Devices
, vol.48
, Issue.2
, pp. 377-385
-
-
Sedky, S.1
-
4
-
-
0032048867
-
IR bolometers made of polycrystalline silicon germanium
-
S. Sedky, et al., 'IR bolometers made of polycrystalline silicon germanium', Sensors and actuators A 66, pp. 193-199, 1998.
-
(1998)
Sensors and actuators A
, vol.66
, pp. 193-199
-
-
Sedky, S.1
-
5
-
-
3042819312
-
Novel High Growth Rate Processes for Depositing Poly-SiGe Structural Layers at CMOS Compatible Temperatures', Proc
-
A. Mehta, et al., 'Novel High Growth Rate Processes for Depositing Poly-SiGe Structural Layers at CMOS Compatible Temperatures', Proc. IEEE MEMS 2004, pp. 721-724.
-
(2004)
IEEE MEMS
, pp. 721-724
-
-
Mehta, A.1
-
6
-
-
4544330328
-
-
M. Gromova, et al., 'The Novel Use of Low Temperature Hydrogenated Microcrystalline Silicon Germanium (μcSiGe:H) for MEMS Applications', J. of Microelectr. Eng., 76, pp. 266-271, 2004.
-
M. Gromova, et al., 'The Novel Use of Low Temperature Hydrogenated Microcrystalline Silicon Germanium (μcSiGe:H) for MEMS Applications', J. of Microelectr. Eng., vol. 76, pp. 266-271, 2004.
-
-
-
-
7
-
-
50149106985
-
Highly reliable and extremely stable SiGe micro-mirrors
-
Kobe, Japan, pp
-
th IEEE International MEMSConference, MEMS 2007, Kobe, Japan, pp. 759-762, 2007.
-
(2007)
th IEEE International MEMSConference, MEMS
, pp. 759-762
-
-
Gromova, M.1
-
8
-
-
70449970314
-
-
http://www.imec.be/SiGeM/SiGeM-web.pdf
-
-
-
-
10
-
-
65949098568
-
Highly reliable CMOS-integrated 11MPixel SiGe-based micro-mirror arrays for high-end industrial applications
-
San-Francisco, December
-
L. Haspeslagh, et al., "Highly reliable CMOS-integrated 11MPixel SiGe-based micro-mirror arrays for high-end industrial applications", Proceedings IEDM 2008, San-Francisco, December 2008.
-
(2008)
Proceedings IEDM
-
-
Haspeslagh, L.1
-
12
-
-
33847246010
-
Main achievements to date towards the use of RF MEMS into space satellite payloads
-
O. Vendier, et al., "Main achievements to date towards the use of RF MEMS into space satellite payloads", Proc. of the European Microwave Conference, pp. 285-288, 2005.
-
(2005)
Proc. of the European Microwave Conference
, pp. 285-288
-
-
Vendier, O.1
-
13
-
-
33847182792
-
MEMS-IC integration for RF and millimeterwave applications
-
D. Dubuc, et al., "MEMS-IC integration for RF and millimeterwave applications", Proc. of the European Microwave Conference, pp. 529-532, 2005.
-
(2005)
Proc. of the European Microwave Conference
, pp. 529-532
-
-
Dubuc, D.1
-
15
-
-
21044437586
-
Filter-Through device: A distributed RF MEMS capacitive series switch
-
X. Rottenberg, et al., "Filter-Through device: A distributed RF MEMS capacitive series switch", Journal of Micromechanics and Microengineering, vol. 15, 2005, S97-S102
-
(2005)
Journal of Micromechanics and Microengineering
, vol.15
-
-
Rottenberg, X.1
-
16
-
-
0038374162
-
-
H. Tilmans, et al., MEMS for wireless communications: 'from RF-MEMS components to RF-MEMS-SiP', J. of Micromech. and Microeng., 13 (2003), S139-S163
-
H. Tilmans, et al., "MEMS for wireless communications: 'from RF-MEMS components to RF-MEMS-SiP'", J. of Micromech. and Microeng., vol 13 (2003), S139-S163
-
-
-
-
17
-
-
2942681775
-
MEMS 0-level packaging using thin film poly-SiGe caps
-
Denver, Colorado, Sept 6-8
-
C. Rusu, et al., "MEMS 0-level packaging using thin film poly-SiGe caps", Proc. IMAPS ATW on Packaging of MEMS and Related Micro Integrated Nano Systems, Denver, Colorado, Sept 6-8, 2002.
-
(2002)
Proc. IMAPS ATW on Packaging of MEMS and Related Micro Integrated Nano Systems
-
-
Rusu, C.1
-
18
-
-
70449975144
-
-
H. Stahl, et al., 'Thin Film Encapsulation of Acceleration Sensors Using Polysilicon Sacrificial Layers' Proc. Transd. 2003, pp. 1899- 1902, 2003.
-
H. Stahl, et al., 'Thin Film Encapsulation of Acceleration Sensors Using Polysilicon Sacrificial Layers' Proc. Transd. 2003, pp. 1899- 1902, 2003.
-
-
-
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