Piezoresistive position sensing for the detection of hysteresis and dielectric charging in CMOS-MEMS variable capacitors

IEEE Transactions on Microwave Theory and Techniques

Volumn 58, Issue 12 PART 2, 2010, Pages 3961-3970

  Zahirovic, Nino ^a   Mansour, Raafat R ^a   Yu, Ming ^b  

^a UNIVERSITY OF WATERLOO   (Canada)

^b COM DEV International Ltd ^*  (Canada)

Author keywords

MEMS components and techniques; MEMS for multifunctional wireless communications systems; MEMS reliability; Microelectromechanical systems (MEMS); microsensors; tunable microwave circuits

Indexed keywords

CLOSED-LOOP CONTROL; CMOS PROCESSS; CMOS-MEMS; DIELECTRIC CHARGING; FABRICATED DEVICE; MEMS RELIABILITY; MEMS VARIABLE CAPACITORS; MICROELECTROMECHANICAL SYSTEMS; PIEZORESISTANCE; PIEZORESISTIVE POSITION SENSING; PIEZORESISTIVE PROPERTIES; POLYSILICON LAYERS; POSITION SENSING; POSITION SENSORS; POTENTIAL APPLICATIONS; RF MEMS VARIABLE CAPACITOR; SENSING MECHANISM; SENSING SCHEMES; TUNABLE MICROWAVE;

BANDPASS FILTERS; CAPACITORS; CMOS INTEGRATED CIRCUITS; HYSTERESIS; MECHATRONICS; MEMS; MICROELECTROMECHANICAL DEVICES; MICROSENSORS; MICROWAVE CIRCUITS; MICROWAVE DEVICES; POLYSILICON; VARIABLE FREQUENCY OSCILLATORS; WIRELESS TELECOMMUNICATION SYSTEMS;

COMPOSITE MICROMECHANICS;

EID: 78650418218     PISSN: 00189480     EISSN: None     Source Type: Journal    
DOI: 10.1109/TMTT.2010.2086069     Document Type: Conference Paper

References (18)

1. G. Rebeiz, K. Entesari, I. Reines, S.J. Park, M. El-Tanani, A. Grichener, and A. Brown, "Tuning in to RF MEMS," IEEE Microw. Mag., vol. 10, no. 6, pp. 55-72, Oct. 2009.
2. F. Domingue, S. Fouladi, A. B. Kouki, and R. R. Mansour, "Design methodology and optimization of distributed MEMS matching networks for low-microwave-frequency applications," IEEE Trans. Microw. Theory Tech., vol. 57, no. 12, pp. 3030-3041, Dec. 2009.
3. S.-J. Park, I. Reines, C. Patel, and G. M. Rebeiz, "High-Q RF-MEMS 4-6 GHz tunable evanescent-mode cavity filter," IEEE Trans. Microw. Theory Tech., vol. 58, no. 2, pp. 381-389, Feb. 2010.
4. G. M. Rebeiz, RF MEMS: Theory, Design and Technology. Hoboken, NJ: Wiley, 2003.
5. J. Seeger and S. Crary, "Stabilization of electrostatically actuated mechanical devices," in Proc. Int. Solid State Sens. Actuators Conf., Jun. 16-19, 1997, vol. 2, pp. 1133-1136.
6. M. Shavezipur, A. Khajepour, and S. Hashemi, "A novel linearly tunable butterfly-shape MEMS capacitor," Microelectron. J., vol. 39, no. 5, pp. 756-762, 2008. (Pubitemid 351735845)
7. M. Bakri-Kassem and R. R. Mansour, "A high-tuning-range MEMS variable capacitor using carrier beams," Can. J. Electr. Comput. Eng., vol. 31, no. 2, pp. 89-95, 2006. (Pubitemid 46103944)
8. M. Bakri-Kassem, S. Fouladi, and R. R. Mansour, "Novel high-Q MEMS curled-plate variable capacitors fabricated in 0.35 μm CMOS technology," IEEE Trans. Microw. Theory Tech., vol. 56, no. 2, pp. 530-541, Feb. 2008. (Pubitemid 351207485)
9. N. Zahirovic, R. R. Mansour, and M. Yu, "A three-step high-Q variable MEMS capacitor with low actuation voltage," in Proc. Eur. Microw. Conf., 2009, pp. 1136-1139.
10. X. Rottenberg, I. De Wolf, B. K. J. C. Nauwelaers, W. De Raedt, and H. A. C. Tilmans, "Analytical model of the DC actuation of electrostatic MEMS devices with distributed dielectric charging and nonplanar electrodes," J. Microelectromech. Syst., vol. 16, no. 5, pp. 1243-1253, Oct. 2007. (Pubitemid 47528019)
11. N. Zahirovic, R. R. Mansour, and M. Yu, "A MEMS variable capacitor with, piezoresistive position sensing fabricated in a standard 0.35 μm CMOS process," in Proc. IEEE MTT-S Int. Microw. Symp. Digest, 2010, pp. 1154-1157.
12. M. S.-C. Lu and G. K. Fedder, "Position control of parallel-plate microactuators for probe-based data storage," J. Microelectromech. Syst., vol. 13, no. 5, pp. 759-769, Oct. 2004.
13. D. Piyabongkam, Y. Sun, R. Rajamani, A. Sezen, and B. J. Nelson, "Travel range extension of a MEMS electrostatic microactuator," IEEE Trans. Control Syst. Technol., vol. 13, no. 1, pp. 138-145, Jan. 2005. (Pubitemid 40118935)
14. G. K. Fedder, S. Santhanam, M. L. Reed, S. C. Eagle, D. F. Guillou, M. S.-C. Lu, and L. R. Carley, "Laminated high-aspect-ratio microstructures in a conventional CMOS process," in Proc. Int. Workshop Microelectr. Mech. Syst., 1996, pp. 13-18. (Pubitemid 126371389)
15. M. G. el. Hak, Ed., MEMS Design and Fabrication. Boca Raton, FL: CRC Press, 2006.
16. S. Hafizovic, K.-U. Kirstein, and A. Hierlemann, Applied Scanning Probe Methods V - Integrated Cantilevers and Atomic Force Microscopes, ser. Nanoscience and Technology. Berlin, Germany: Springer, 2007.
17. J. J. Neumann, D. W. Greve, and I. J. Oppenheim, "Comparison of piezoresistive and capacitive ultrasonic transducers," in Proc. SPIE, S.-C. Liu, Ed., 2004, vol. 5391, no. 1, pp. 230-238.
18. J.-C. Chiou, L.-J. Shieh, and Y.-J. Lin, "CMOS-MEMS prestress vertical cantilever resonator with electrostatic driving and piezoresistive sensing," J. Phys. D, Appl. Phys. vol. 41, no. 20, p. 205102, 2008.